Pixel length calibration using a pattern matching method for secondary-electron images

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8769, Issue , 2013, Pages

  Sugawara, Kentaro ^a   Misumi, Ichiko ^a   Gonda, Satoshi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Metrology; Nanoparticle; Pattern matching; Scanning electron microscope; Traceability

Indexed keywords

CALIBRATION METHOD; IMAGE PROCESSING TECHNIQUE; LASER INTERFEROMETER; MEASUREMENT UNCERTAINTY; NANO-PARTICLE MEASUREMENTS; SCANNING ELECTRON MICROSCOPE; SECONDARY-ELECTRON IMAGE; TRACEABILITY;

CALIBRATION; IMAGE PROCESSING; LASER INTERFEROMETRY; MEASUREMENTS; NANOPARTICLES; NANOTECHNOLOGY; OPTICAL DATA PROCESSING; PATTERN MATCHING; PRECISION ENGINEERING; SCANNING ELECTRON MICROSCOPY; UNCERTAINTY ANALYSIS;

PIXELS;

EID: 84881355585     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2021086     Document Type: Conference Paper

References (6)

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6. Current status is Draft A: Supplementary Comparison on Nanoparticle Size.