Influence of r.f power on structural properties of ZnO thin films

Journal of Crystal Growth

Volumn 381, Issue , 2013, Pages 51-56

  Evcimen Duygulu, N ^a   Kodolbas, A O ^b   Ekerim, A ^a  

^a YILDIZ TECHNICAL UNIVERSITY   (Turkey)

^b NATIONAL METROLOGY INSTITUTE   (Turkey)

Author keywords

A1. Atomic force microscopy; A1. High resolution transmission electron microscopy; A1. X ray diffraction; A3. r.f. Magnetron sputtering; B1. Zinc oxide

Indexed keywords

FIGURE OF MERIT (FOM); FOUR-POINT PROBE TECHNIQUES; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; OPTICAL TRANSMISSION MEASUREMENTS; POWER VARIATIONS; R.F. MAGNETRON SPUTTERING; ROOM-TEMPERATURE CONDITIONS; STRUCTURAL EXAMINATION;

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; OPTICAL FILMS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY DIFFRACTION;

METALLIC FILMS;

EID: 84880897042     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2013.07.008     Document Type: Article

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