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Volumn 28, Issue 8, 2013, Pages

Silicon passivation and tunneling contact formation by atomic layer deposited Al2O3/ZnO stacks

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITED; CONTACT FORMATION; P-TYPE SI; PHOTOVOLTAICS; SINGLE LAYER; SURFACE PASSIVATION; SURFACE RECOMBINATION VELOCITIES; TUNNELING CURRENT;

EID: 84880293546     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/28/8/082002     Document Type: Article
Times cited : (35)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.