Designing a photoresponsive molecularly imprinted system on a silicon wafer substrate surface

Langmuir

Volumn 29, Issue 26, 2013, Pages 8311-8319

  Wang, Dongsheng ^a   Xie, Danyang ^a   Shi, Wenbin ^a   Sun, Shudong ^a   Zhao, Changsheng ^a  

^a SICHUAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

4-HYDROXYBENZOIC ACIDS; ADSORPTION CAPACITIES; HOST GUEST COMPLEXES; LANGMUIR ADSORPTION ISOTHERMS; MOLECULAR IMPRINTING; MOLECULARLY IMPRINTED; SELECTIVE ADSORPTION; SILICON WAFER SUBSTRATES;

BINDING ENERGY; MOLECULES; SILICON;

SILICON WAFERS;

EID: 84880226493     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la401201w     Document Type: Article

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