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Volumn 102-103, Issue , 2013, Pages 30-32
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Magnetron sputtering deposited MnO1.9 thin film for supercapacitor
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Author keywords
Magnetron sputtering; Manganese oxide; Supercapacitors; Thin film
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Indexed keywords
AMORPHOUS FILMS;
CYCLIC VOLTAMMETRY;
ELECTROCHEMICAL ELECTRODES;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
MAGNETRON SPUTTERING;
MANGANESE OXIDE;
SUPERCAPACITOR;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION;
AMORPHOUS STRUCTURES;
CAPACITIVE BEHAVIOR;
COPPER SUBSTRATES;
DISCHARGE-CHARGE;
ELECTRODE MATERIAL;
MORPHOLOGY AND STRUCTURES;
SUPERCAPACITOR APPLICATION;
X-RAY DIFFRACTION MEASUREMENTS;
THIN FILMS;
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EID: 84880066154
PISSN: 0167577X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.matlet.2013.03.098 Document Type: Article |
Times cited : (18)
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References (14)
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