Fabrication of A-Si:H Solar cells on high haze SnO2:F thin films

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2008, Pages

  Kambe, Mika ^a   Takahashi, Akira ^a   Taneda, Naoki ^a   Masumo, Kunio ^a   Oyama, Takuji ^a   Sato, Kazuo ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H SOLAR CELLS; AMORPHOUS SILICON (A-SI:H); DEPOSITION CONDITIONS; FLUORINE DOPED TIN OXIDE; GLASS SUBSTRATES; OPTICAL REGIONS; PYRAMIDAL TEXTURES; TRANSPARENT CONDUCTIVE OXIDES;

FABRICATION; OPEN CIRCUIT VOLTAGE; SILICON; SUBSTRATES; THIN FILMS;

SOLAR CELLS;

EID: 84879724403     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2008.4922507     Document Type: Conference Paper

References (10)

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