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Volumn , Issue , 2008, Pages

Electrical and chemical characterization of chemically passivated silicon surfaces

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CHARACTERIZATION; FTIR TECHNIQUES; HF TREATMENT; INERT SURFACES; MINORITY CARRIER LIFETIMES; SILICON SUBSTRATES; SILICON SURFACES;

EID: 84879721499     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2008.4922673     Document Type: Conference Paper
Times cited : (3)

References (6)
  • 1
    • 6344243289 scopus 로고    scopus 로고
    • Surface passivation of silicon substrates using quinhydrone/methanol treatment
    • Hidetaka Takato, Isao Sakata and Ryuichi Shimokawa, "Surface Passivation of silicon substrates using Quinhydrone/methanol treatment", 1'" World Conference on Photovoltaic Energy Conversion, 2, pp. 1108-11 (2003).
    • (2003) World Conference on Photovoltaic Energy Conversion , vol.1 , Issue.2 , pp. 1108-1111
    • Takato, H.1    Sakata, I.2    Shimokawa, R.3
  • 3
    • 0036141466 scopus 로고    scopus 로고
    • Very low bulk and surface recombination in oxidized silicon wafers
    • M. J. Kerr and A. Cuevas, "Very Low Bulk and Surface Recombination in Oxidized Silicon Wafers" Semi. Sci. and Tech., 17, pp. 35-38, (2002).
    • (2002) Semi. Sci. and Tech. , vol.17 , pp. 35-38
    • Kerr, M.J.1    Cuevas, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.