Microbial inactivation by electric discharge with metallic grid

Acta Physica Polonica A

Volumn 124, Issue 1, 2013, Pages 62-65

  Scholtz, V ^a   Kvasnilkova E ^a   Julak J ^b  

^a INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

^b CHARLES UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

GRAM-NEGATIVE BACTERIA; GRAM-POSITIVE BACTERIUM; LOW TEMPERATURE PLASMAS; METALLIC GRID; MICROBIAL INACTIVATION; TARGET OBJECT;

BACTERIA;

ELECTRIC DISCHARGES;

EID: 84879116836     PISSN: 05874246     EISSN: 1898794X     Source Type: Journal    
DOI: 10.12693/APhysPolA.124.62     Document Type: Article

References (21)

1. M. Laroussi, Plasma Process. Polym. 2, 391 (2005).
2. M. Moreau, N. Orange, M.G.J. Feuilloley, Biotechnol. Adv. 26, 610 (2008).
3. M.G. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. van Dijk, J.L. Zimmerman, New J. Phys. 11, 115012 (2009).
4. M. Laroussi, IEEE Trans. Plasma Sci. 37, 714 (2009).
5. J. Ehlbeck, U. Schnabel, M. Polak, J. Winter, Th. von Woedtke, R. Brandenburg, T. von dem Hagen, K.-D. Weltmann, J. Phys. D, Appl. Phys. 44, 013002 (2011).
6. G. Lloyd, G. Friedman, S. Jafri, G. Schultz, A. Fridman, K. Harding, Plasma Process. Polym. 7, 194 (2010).
7. Applications of Low-Temperature Gas Plasmas in Medicine and Biology, Eds. M. Laroussi, M.G. Kong, G. Morfill, W. Stolz, Cambridge University Press, Cambridge 2012.
8. V. Scholtz, L. Kommová, J. Julák, Acta Phys. Pol. A 119, 803 (2011).
9. V. Scholtz, J. Julák, J. Phys., Conf. Ser. 223, 012005 (2010).
10. V. Scholtz, J. Julák, IEEE Trans. Plasma Sci. 38, 1978 (2010).
11. M. Laroussi, Plasma generator, Patent No. WO 2006/096716 A2, PCT/US2006/008080, Sep. 14 (2006).
12. X. Lu, Z. Xiong, F. Zhao, Y. Xian, Q. Xiong, W. Gong, C. Zou, Z. Jiang, Y. Pan, Appl. Phys. Lett. 95, 501 (2009).
13. Z. Machala, L. Chládeková, M. Pelach, J. Phys. D, Appl. Phys. 43, 001 (2010).
14. V. Scholtz, J. Julák, V. Kíha, Plasma Process. Polym. 7, 237 (2010).
15. E. Stoffels, Y.A. Gonzalvo, T.D. Whitmore, D.L. Seymour, J.A. Rees, Plasma Sources Sci. Technol. 16, 549 (2007).
16. S. Mededovic, B.R. Locke, J. Phys. D, Appl. Phys. 40, 7734 (2007).
17. H.W. Lee, G.Y. Park, Y.S. Seo, Y.H. Im, S.B. Shim, H.J. Lee, J. Phys. D, Appl. Phys. 44, 053001 (2011).
18. S. Ikawa, K. Kitano, S. Hamaguchi, Plasma Process. Polym. 7, 33 (2010).
19. K. Oehmigen, M. Hähnel, R. Brandenburg, Ch. Wilke, K.-D. Weltmann, Th. von Woedtke, Plasma Process. Polym. 7, 250 (2010).
20. K. Oehmigen, J. Winter, M. Hähnel, Ch. Wilke, R. Brandenburg, K.-D. Weltmann, Th. von Woedtke, Plasma Process. Polym. 8, 904 (2011).
21. J. Julák, V. Scholtz, S. Kotúová, O. Janoušková, Phys. Med. 28, 230 (2012).