Temperature dependence study of Pd-Cu supported bimetallic films by photoelectron spectroscopy and cyclic voltammetry

Electrochimica Acta

Volumn 105, Issue , 2013, Pages 362-370

  Hu, Shuozhen ^a   Ha, Su ^a   Scudiero, Louis ^a  

^a Washington State University   (United States)

Author keywords

Density of state; Formic acid electrochemical oxidation; Palladium copper bimetallic films; Temperature dependence CV; Temperature dependence XPS

Indexed keywords

ANNEALING; BINDING ENERGY; CARBON; CARBON FILMS; CATALYST ACTIVITY; CHARGE TRANSFER; COPPER; CYCLIC VOLTAMMETRY; DEPTH PROFILING; DIFFUSION; DISSIMILAR METALS; ELECTROCHEMICAL OXIDATION; FORMIC ACID; METALLIC FILMS; PHOTOELECTRONS; PHOTONS; TEMPERATURE DISTRIBUTION; X RAY PHOTOELECTRON SPECTROSCOPY;

BI-METALLIC FILMS; DENSITY OF STATE; FORMIC ACID ELECTROCHEMICAL OXIDATIONS; INCREASING TEMPERATURES; INTERFACIAL CHARGE TRANSFER; OPTIMUM CONFIGURATIONS; TEMPERATURE DEPENDENCE; VAPOR DEPOSITION METHOD;

PALLADIUM;

EID: 84878724961     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2013.05.012     Document Type: Article

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