Large area selective emitters/absorbers based on 2D tantalum photonic crystals for high-temperature energy applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8632, Issue , 2013, Pages

  Rinnerbauer, V ^a   Yeng, Y X ^a   Senkevich, J J ^a   Joannopoulos, J D ^a   Soljacic M ^a   Celanovic, I ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

High temperature; Photonic crystal; Tantalu; Thermal emitter; Thermophotovoltaic

Indexed keywords

2-D PHOTONIC CRYSTALS; DEEP REACTIVE ION ETCH; HIGH TEMPERATURE; INTERFERENCE LITHOGRAPHY; MICROFABRICATION PROCESS; TANTALU; THERMAL EMITTER; THERMOPHOTOVOLTAICS;

ASPECT RATIO; ATOMIC LAYER DEPOSITION; FABRICATION; NANOLITHOGRAPHY; NANOSTRUCTURES; PHOTOVOLTAIC CELLS; SUBSTRATES; SULFUR HEXAFLUORIDE; TANTALUM; THERMAL BARRIER COATINGS;

PHOTONIC CRYSTALS;

EID: 84878321023     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2005202     Document Type: Conference Paper

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