Real-time investigations on the formation of Cu(In,Ga)(S,Se)2 while annealing Cu-In-Ga precursors with different sulphur-selenium mixtures

Thin Solid Films

Volumn 535, Issue 1, 2013, Pages 112-117

  Holzing A ^a   Schurr, R ^a   Yoo, H ^a   Wibowo, R A ^a   Lechner, R ^b   Palm, J ^b   Jost, S ^b   Hock, R ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b AVANCIS GMBH   (Germany)

Author keywords

Chalcogenisation; Chalcopyrite; Cu(In,Ga)(S,Se)2; Formation reaction; Growth model; Sulphoselenisation

Indexed keywords

CHALCOGENISATION; CHALCOPYRITE; CU(IN ,GA)(S ,SE)2; FORMATION REACTION; GROWTH MODELS; SULPHOSELENISATION;

ANNEALING; CHALCOGENIDES; CONVERSION EFFICIENCY; GALLIUM; METAL ANALYSIS; NEGATIVE IONS; POSITIVE IONS; RIETVELD REFINEMENT; SEMICONDUCTING SELENIUM COMPOUNDS; SOLID SOLUTIONS;

GALLIUM ALLOYS;

EID: 84878200620     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.11.059     Document Type: Conference Paper

References (16)

1. J. Palm, V. Probst, W. Stetter, R. Toelle, S. Visbeck, H. Calwer, T. Niesen, H. Vogt, O. Hernandez, M. Wendl, and F.H. Karg Thin Solid Films 451/452 2004 544
2. A. Hölzing, R. Schurr, S. Jost, J. Palm, K. Deseler, P. Wellmann, and R. Hock Thin Solid Films 519 21 2011 7197
3. A. Hölzing, R. Schurr, S. Jost, J. Palm, K. Deseler, P.J. Wellmann, and R. Hock Mater. Res. Soc. Symp. Proc. 1165 2009 25 (1165-M02-02)
4. A. Hölzing, R. Schurr, H. Schäfer, A. Jäger, S. Jost, J. Palm, K. Deseler, P. Wellmann, and R. Hock Thin Solid Films 517 7 2009 2213
5. P.G. Rustamov, and Z.D. Melikova Inorg. Mater. 9 10 1973 1492
6. M. Ishii, K. Shibata, and H. Nozaki J. Solid State Chem. 105 2 1993 504
7. F. Hergert, S. Jost, R. Hock, and M. Purwins J. Palm Phys. Stat. Sol. A 203 11 2006 2615
8. V. Krämer, R. Nitsche, and J. Ottemann J. Cryst. Growth 7 3 1970 285
9. H. Haeuseler, E. Elitok, A. Memo, and R. Arzani Z. anorg. allg. Chem. 627 6 2001 1204
10. G.P. Bernardini, G. Mazzetti, A. Sega, and G. Tanelli N. Jb. Mineral. Mh. 7 1977 299
11. G.P. Bernardini, F. Corsini, G. Mazzetti, and G. Tanelli Chem. Erde 35 1 1976 50
12. H. Haeuseler, E. Elitok, A. Memo, and A. Osnowsky Mater. Res. Bull 36 3-4 2001 737
13. S. Nishiwaki, and W.N. Shafarman J. Appl. Phys. 104 3 2008 034912
14. G.M. Hanket, W.N. Shafarman, B.E. McCandless, and R.W. Birkmire J. Appl. Phys. 102 7 2007 074922
15. O. Lundberg, J. Lu, A. Rockett, M. Edoff, and L. Stolt J. Phys. Chem. Sol. 64 9-10 2003 1499
16. C. Sanz, C. Guillén, and M.T. Gutiérrez J. Phys. D: Appl. Phys. 41 23 2008 235103