Transparent Conductive Oxides for Transparent Electrode Applications

Semiconductors and Semimetals

Volumn 88, Issue , 2013, Pages 159-200

  Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

FTO; ITO; Magnetron sputtering; MOCVD; Oxide semiconductor; TCO; Thin film; Transparent conducting oxide; Transparent electrode; ZnO

Indexed keywords

CARRIER CONCENTRATION; FLAT PANEL DISPLAYS; II-VI SEMICONDUCTORS; INDIUM COMPOUNDS; MAGNETIC SEMICONDUCTORS; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALS; MOS DEVICES; OPTICAL PROPERTIES; OXIDE MINERALS; OXIDE SEMICONDUCTORS; THIN FILM SOLAR CELLS; THIN FILMS; TRANSPARENT CONDUCTING OXIDES; WIDE BAND GAP SEMICONDUCTORS; ZINC OXIDE;

APPLICATION FIELDS; BINARY COMPOUNDS; METAL OXIDE SEMICONDUCTOR; MULTI-COMPONENT OXIDES; N-TYPE SEMICONDUCTORS; THIN FILM MATERIAL; TRANSPARENT AND CONDUCTIVE OXIDE THIN FILMS; TRANSPARENT CONDUCTIVE OXIDES;

TRANSPARENT ELECTRODES;

EID: 84878143542     PISSN: 00808784     EISSN: None     Source Type: Book Series    
DOI: 10.1016/B978-0-12-396489-2.00005-9     Document Type: Chapter

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