Compatibility of glass textures with E-beam evaporated polycrystalline silicon thin-film solar cells

Applied Physics A: Materials Science and Processing

Volumn 111, Issue 3, 2013, Pages 935-942

  Cui, Hongtao ^a   Campbell, Patrick R ^a   Green, Martin A ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON (A-SI); HIGH-RATE DEPOSITION; INTERNAL QUANTUM EFFICIENCY; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITIONS (PECVD); POLYCRYSTALLINE SILICON THIN FILM; ROOT MEAN SQUARE ROUGHNESS; SILICON THIN-FILM SOLAR CELLS; THIN FILM SOLAR CELL TECHNOLOGY;

ABSORPTION SPECTROSCOPY; DEPOSITION; EVAPORATION; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SILICON NITRIDE; SOLAR CELLS; SUBSTRATES; TEXTURES;

GLASS;

EID: 84878108453     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-012-7318-3     Document Type: Article

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