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Volumn , Issue , 2011, Pages 49-54

Commercial-off-the-shelf 3D integration using low temperature ws

Author keywords

Low temperature wafer bonding; Plasma surface activation; Polyimide; Wt

Indexed keywords

BONDING TECHNOLOGY; COMMERCIAL-OFF-THE-SHELF; COVALENT BONDING; LONG-TERM ANNEALING; LOW TEMPERATURE WAFER BONDING; PLASMA SURFACES; THROUGH-SILICON-VIA (TSV); WT;

EID: 84877866836     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (7)
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  • 3
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    • Michael Khbeis, et al. "Fabrication of high-density substrate of advanced 3-D integrated modules, " IMAPS Advanced substrate, pp. 28-33, 2008.
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  • 4
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    • Surface activation for low temperature wafer fusion bonding by radicals produced in an oxygen discharge
    • Jan Kowal, et al, "Surface activation for low temperature wafer fusion bonding by radicals produced in an oxygen discharge, " Sensors and Actuators A, 155, pp. 145-151, 2009.
    • (2009) Sensors and Actuators A , vol.155 , pp. 145-151
    • Kowal, J.1
  • 5
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    • 2 plasma activated wafer bonding
    • Benoit Olbrechts, et al, "Effect of interfacial Si02 thickness for low temperature 02 plasma activated wafer bonding, " Microsys. Tech. 12 (5), pp. 383-390, 2006.
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  • 6
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  • 7
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    • A novel room-temperature wafer direct bonding method by fluorine containing plasma activation
    • Chenxi Wang, et al, "A novel room-temperature wafer direct bonding method by fluorine containing plasma activation, " IEEE ECTC, pp. 303-308, 2010.
    • (2010) IEEE ECTC , pp. 303-308
    • Wang, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.