Diffusion kinetics of indium in TiO2 (Rutile)

Journal of the American Ceramic Society

Volumn 96, Issue 5, 2013, Pages 1366-1371

  Atanacio, Armand J ^a,b   Bak, Tadeusz ^b   Nowotny, Janusz ^b   Prince, Kathryn E ^a  

^a AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^b UNIVERSITY OF WESTERN SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION PROFILES; DIFFUSION CONCENTRATIONS; DIFFUSION KINETICS; DIFFUSION PROFILES; OPTIMAL PROCESSING; SELF-DIFFUSION COEFFICIENTS; TEMPERATURE DEPENDENCE; THIN SURFACE LAYER;

ACTIVATION ENERGY; DIFFUSION IN LIQUIDS; INDIUM; OXIDE MINERALS; SECONDARY ION MASS SPECTROMETRY; TITANIUM DIOXIDE;

SINGLE CRYSTALS;

EID: 84877729446     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/jace.12244     Document Type: Article

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