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Angewandte Chemie - International Edition

Volumn 52, Issue 20, 2013, Pages 5280-5284

Uniform Si-CHA zeolite layers formed by a selective sonication-assisted deposition method

(4) Kim, Eunjoo a Cai, Wanxi a Baik, Hionsuck b Choi, Jungkyu a

a Korea University (South Korea)

b Korea Basic Science Institute (KBSI) (South Korea)

Author keywords

silica; sonication; uniform layers; X ray diffraction; zeolites

Indexed keywords

BROAD SIZE DISTRIBUTION; CLOSE-PACKED LAYERS; DEPOSITION METHODS; SECONDARY GROWTH; UNIFORM LAYER; ZEOLITE FILM; ZEOLITE LAYERS;

SILICA; SONICATION; X RAY DIFFRACTION; ZEOLITES;

SILICON;

EID: 84877299377 PISSN: 14337851 EISSN: 15213773 Source Type: Journal
DOI: 10.1002/anie.201301265 Document Type: Article

Times cited : (32)

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