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Volumn , Issue , 2012, Pages 612-618

Synthesis of nanoparticles by RF induction thermal plasma

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EID: 84877296530     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/B978-0-444-56336-1.50059-X     Document Type: Chapter
Times cited : (3)

References (12)
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    • The powder processing technologies by thermal plasma method
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    • (2008) J. Soc. Powder Technol. Jpn. , vol.45 , pp. 30-38
    • Nakamura, K.1    Yubuta, K.2
  • 5
    • 84963482904 scopus 로고
    • Theory of particle formation and growth in oxide synthesis flames
    • Ulrich G.D. Theory of particle formation and growth in oxide synthesis flames. Combust. Sci. Tech. 1971, 4:47-57.
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    • Ulrich, G.D.1
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    • Influence of process conditions on the size of ultrafine Ni particles produced by thermal plasma method
    • Udaka M., Kawasaki K., Yamazaki T., Umemoto M., Okane I. Influence of process conditions on the size of ultrafine Ni particles produced by thermal plasma method. J. Jpn. Inst. Metals 1994, 58:683-690.
    • (1994) J. Jpn. Inst. Metals , vol.58 , pp. 683-690
    • Udaka, M.1    Kawasaki, K.2    Yamazaki, T.3    Umemoto, M.4    Okane, I.5
  • 7
    • 33847029604 scopus 로고    scopus 로고
    • Controlled synthesis of alumina nanoparticles using inductively coupled thermal plasma with enhanced quenching
    • Ye R., Li J.G., Ishigaki T. Controlled synthesis of alumina nanoparticles using inductively coupled thermal plasma with enhanced quenching. Thin Solid Films 2007, 515:4251-4257.
    • (2007) Thin Solid Films , vol.515 , pp. 4251-4257
    • Ye, R.1    Li, J.G.2    Ishigaki, T.3
  • 10
    • 0018491299 scopus 로고
    • The synthesis of ultrafine titanium nitride in an R.F. plasma
    • Yoshida T., Kawasaki A., Nakagawa K., Akashi K. The synthesis of ultrafine titanium nitride in an R.F. plasma. J. Mater. Sci. 1979, 14:1624-1630.
    • (1979) J. Mater. Sci. , vol.14 , pp. 1624-1630
    • Yoshida, T.1    Kawasaki, A.2    Nakagawa, K.3    Akashi, K.4
  • 11
    • 0032022228 scopus 로고    scopus 로고
    • Preparation of AlN fine powder by thermal plasma processing
    • Oh S.M., Park D.W. Preparation of AlN fine powder by thermal plasma processing. Thin Solid Films 1998, 316:189-194.
    • (1998) Thin Solid Films , vol.316 , pp. 189-194
    • Oh, S.M.1    Park, D.W.2
  • 12
    • 0000626632 scopus 로고
    • Preparation of ultrafine silicon nitride, and silicon nitride and silicon carbide mixed powders in a hybrid plasma
    • Lee H.J., Eguchi K., Yoshida T. Preparation of ultrafine silicon nitride, and silicon nitride and silicon carbide mixed powders in a hybrid plasma. J. Am. Ceram. Soc. 1990, 73:3356-3362.
    • (1990) J. Am. Ceram. Soc. , vol.73 , pp. 3356-3362
    • Lee, H.J.1    Eguchi, K.2    Yoshida, T.3


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