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Volumn 87, Issue 4, 2013, Pages

Electrostatic repulsion-driven crystallization model arising from filament networks

Author keywords

[No Author keywords available]

Indexed keywords

CONFINEMENT POTENTIAL; CRYSTALLIZATION MECHANISMS; CRYSTALLIZATION MODELS; HEXAGONAL CRYSTALLINE; LONG-RANGE REPULSIONS; PHENOMENOLOGICAL MODELS; SCREENING LENGTHS; TOPOLOGICAL DEFECT;

EID: 84876900230     PISSN: 15393755     EISSN: 15502376     Source Type: Journal    
DOI: 10.1103/PhysRevE.87.042605     Document Type: Article
Times cited : (6)

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