Dry etching of low K materials

Proceedings of the IEEE 1999 International Interconnect Technology Conference, IITC 1999

Volumn , Issue , 1999, Pages 97-99

  Vanhaelemeersch, S ^a   Alaerts, C ^a   Baklanov, M ^a   Struyf, H ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT INTERCONNECTS;

BACK-END INTEGRATION; DRY ETCH PROCESS; DUAL DAMASCENE; ETCH PROCESS; FINE TUNING; HAND IN HANDS; LOW-K MATERIALS;

DRY ETCHING;

EID: 84876213450     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.1999.787089     Document Type: Conference Paper

References (0)