Phase modulation in horizontal metal-insulatorsilicon-insulator-metal plasmonic waveguides

Optics Express

Volumn 21, Issue 7, 2013, Pages 8320-8330

  Zhu, Shiyang ^a   Lo, G Q ^a   Kwong, D L ^a  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETERS; METAL INSULATOR BOUNDARIES; OPTICAL WAVEGUIDES; PHASE MODULATION; SEMICONDUCTOR INSULATOR BOUNDARIES; SILICA;

EXTINCTION RATIOS; LOW DRIVING VOLTAGE; PHASE MODULATOR; PLASMONIC WAVEGUIDES; PROOF OF CONCEPT; SILICON-ON-INSULATOR SUBSTRATES; STANDARD COMPLEMENTARY METALOXIDE-SEMICONDUCTOR (CMOS) TECHNOLOGIES; THERMAL SILICON;

SILICON;

METAL; SILICON;

ARTICLE; CHEMISTRY; COMPUTER AIDED DESIGN; ELECTRIC CONDUCTIVITY; ELECTRONICS; EQUIPMENT; EQUIPMENT DESIGN; EQUIPMENT FAILURE; INTERFEROMETRY; SURFACE PLASMON RESONANCE; TELECOMMUNICATION;

COMPUTER-AIDED DESIGN; ELECTRIC CONDUCTIVITY; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; INTERFEROMETRY; METALS; MINIATURIZATION; SILICON; SURFACE PLASMON RESONANCE; TELECOMMUNICATIONS;

EID: 84875996037     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.008320     Document Type: Article

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