-
2
-
-
55749091960
-
-
10.1002/adma.200800366
-
Z. F. Liu, Q. Liu, Y. Huang, Y. F. Ma, S. G. Yin, X. Y. Zhang, W. Sun, and Y. S. Chen, Adv. Mater. 20, 3924 (2008). 10.1002/adma.200800366
-
(2008)
Adv. Mater.
, vol.20
, pp. 3924
-
-
Liu, Z.F.1
Liu, Q.2
Huang, Y.3
Ma, Y.F.4
Yin, S.G.5
Zhang, X.Y.6
Sun, W.7
Chen, Y.S.8
-
3
-
-
82955188685
-
-
10.1002/adma.201102207
-
J.-M. Yun, J.-S. Yeo, J. Kim, H.-G. Jeong, D.-Y. Kim, Y.-J. Noh, S.-S. Kim, B.-C. Ku, and S.-I. Na, Adv. Mater. 23, 4923 (2011). 10.1002/adma.201102207
-
(2011)
Adv. Mater.
, vol.23
, pp. 4923
-
-
Yun, J.-M.1
Yeo, J.-S.2
Kim, J.3
Jeong, H.-G.4
Kim, D.-Y.5
Noh, Y.-J.6
Kim, S.-S.7
Ku, B.-C.8
Na, S.-I.9
-
4
-
-
84869427499
-
-
10.1002/adma.201201587
-
X. Huang, Z. Y. Zeng, Z. X. Fan, J. Q. Liu, and H. Zhang, Adv. Mater. 24, 5979 (2012) 10.1002/adma.201201587.
-
(2012)
Adv. Mater.
, vol.24
, pp. 5979
-
-
Huang, X.1
Zeng, Z.Y.2
Fan, Z.X.3
Liu, J.Q.4
Zhang, H.5
-
5
-
-
0001176962
-
-
10.1063/1.117478
-
A. R. Schlatmann, D. W. Floet, A. Hilberer, F. Garten, P. J. M. Smulders, T. M. Klapwijk, and G. Hadziioannou, Appl. Phys. Lett. 69, 1764 (1996). 10.1063/1.117478
-
(1996)
Appl. Phys. Lett.
, vol.69
, pp. 1764
-
-
Schlatmann, A.R.1
Floet, D.W.2
Hilberer, A.3
Garten, F.4
Smulders, P.J.M.5
Klapwijk, T.M.6
Hadziioannou, G.7
-
6
-
-
0035882150
-
-
10.1016/S0040-6090(01)01138-5
-
Z. Chen, B. Cotterell, W. Wang, E. Guenther, and S.-J. Chua, Thin Solid Films 394, 201 (2001) 10.1016/S0040-6090(01)01138-5.
-
(2001)
Thin Solid Films
, vol.394
, pp. 201
-
-
Chen, Z.1
Cotterell, B.2
Wang, W.3
Guenther, E.4
Chua, S.-J.5
-
7
-
-
55749112499
-
-
10.1002/adma.200800338
-
S.-I. Na, S.-S. Kim, J. Jo, and D.-Y. Kim, Adv. Mater. 20, 4061 (2008). 10.1002/adma.200800338
-
(2008)
Adv. Mater.
, vol.20
, pp. 4061
-
-
Na, S.-I.1
Kim, S.-S.2
Jo, J.3
Kim, D.-Y.4
-
8
-
-
77952911108
-
-
10.1021/nn901587x
-
L. G. De Arco, Y. Zhang, C. W. Schlenker, K. Ryu, M. E. Thompson, and C. W. Zhou, ACS Nano 4, 2865 (2010). 10.1021/nn901587x
-
(2010)
ACS Nano
, vol.4
, pp. 2865
-
-
De Arco, L.G.1
Zhang, Y.2
Schlenker, C.W.3
Ryu, K.4
Thompson, M.E.5
Zhou, C.W.6
-
9
-
-
76749164452
-
-
10.1002/smll.200901968
-
Z. Y. Yin, S. X. Wu, X. Z. Zhou, X. Huang, Q. C. Zhang, F. Boey, and H. Zhang, Small 6, 307 (2010). 10.1002/smll.200901968
-
(2010)
Small
, vol.6
, pp. 307
-
-
Yin, Z.Y.1
Wu, S.X.2
Zhou, X.Z.3
Huang, X.4
Zhang, Q.C.5
Boey, F.6
Zhang, H.7
-
10
-
-
82955194663
-
-
10.1063/1.3664120
-
D. Zhang, W. C. H. Choy, C. C. D. Wang, X. Li, L. L. Fan, K. L. Wang, and H. W. Zhu, Appl. Phys. Lett. 99, 223302 (2011). 10.1063/1.3664120
-
(2011)
Appl. Phys. Lett.
, vol.99
, pp. 223302
-
-
Zhang, D.1
Choy, W.C.H.2
Wang, C.C.D.3
Li, X.4
Fan, L.L.5
Wang, K.L.6
Zhu, H.W.7
-
11
-
-
79953253647
-
-
10.1002/adma.201003673
-
Y. Wang, S. W. Tong, X. F. Xu, B. Özyilmaz, and K. P. Loh, Adv. Mater. 23, 1514 (2011). 10.1002/adma.201003673
-
(2011)
Adv. Mater.
, vol.23
, pp. 1514
-
-
Wang, Y.1
Tong, S.W.2
Xu, X.F.3
Özyilmaz, B.4
Loh, K.P.5
-
12
-
-
84862867936
-
-
10.1021/nn301721q
-
C.-L. Hsu, C.-T. Lin, J.-H. Huang, C.-W. Chu, K.-H. Wei, and L.-J. Li, ACS Nano 6, 5031 (2012). 10.1021/nn301721q
-
(2012)
ACS Nano
, vol.6
, pp. 5031
-
-
Hsu, C.-L.1
Lin, C.-T.2
Huang, J.-H.3
Chu, C.-W.4
Wei, K.-H.5
Li, L.-J.6
-
13
-
-
84865046727
-
-
10.1088/0957-4484/23/34/344013
-
S. Lee, J.-S. Yeo, Y. S. Ji, C. H. Cho, D.-Y. Kim, S.-I. Na, B. H. Lee, and T. Lee, Nanotechnology 23, 344013 (2012). 10.1088/0957-4484/23/34/344013
-
(2012)
Nanotechnology
, vol.23
, pp. 344013
-
-
Lee, S.1
Yeo, J.-S.2
Ji, Y.S.3
Cho, C.H.4
Kim, D.-Y.5
Na, S.-I.6
Lee, B.H.7
Lee, T.8
-
14
-
-
84865446346
-
-
10.1116/1.4739505
-
Y. U. Jung, S.-I. Na, H.-K. Kim, and S. J. Kang, J. Vac. Sci. Technol. A 30, 050604 (2012). 10.1116/1.4739505
-
(2012)
J. Vac. Sci. Technol. A
, vol.30
, pp. 050604
-
-
Jung, Y.U.1
Na, S.-I.2
Kim, H.-K.3
Kang, S.J.4
-
15
-
-
84856190062
-
-
10.1021/nn204675r
-
Z. K. Liu, J. H. Li, Z.-H. Sun, G. A. Tai, S.-P. Lau, and F. Yan, ACS Nano 6, 810 (2012). 10.1021/nn204675r
-
(2012)
ACS Nano
, vol.6
, pp. 810
-
-
Liu, Z.K.1
Li, J.H.2
Sun, Z.-H.3
Tai, G.A.4
Lau, S.-P.5
Yan, F.6
-
16
-
-
80052053961
-
-
10.1021/nn201940j
-
Y.-Y. Lee, K.-H. Tu, C.-C. Yu, S.-S. Li, J.-Y. Hwang, C.-C. Lin, K.-H. Chen, L.-C. Chen, H.-L. Chen, and C.-W. Chen, ACS Nano 5, 6564 (2011). 10.1021/nn201940j
-
(2011)
ACS Nano
, vol.5
, pp. 6564
-
-
Lee, Y.-Y.1
Tu, K.-H.2
Yu, C.-C.3
Li, S.-S.4
Hwang, J.-Y.5
Lin, C.-C.6
Chen, K.-H.7
Chen, L.-C.8
Chen, H.-L.9
Chen, C.-W.10
-
17
-
-
65449136014
-
-
10.1002/cssc.200900029
-
R. Koeppe, D. Hoeglinger, P. A. Troshin, R. N. Lyubovskaya, V. F. Razumov, and N. S. Sariciftci, ChemSusChem 2, 309 (2009). 10.1002/cssc.200900029
-
(2009)
ChemSusChem
, vol.2
, pp. 309
-
-
Koeppe, R.1
Hoeglinger, D.2
Troshin, P.A.3
Lyubovskaya, R.N.4
Razumov, V.F.5
Sariciftci, N.S.6
-
18
-
-
84863714941
-
-
10.1016/j.orgel.2012.06.012
-
D. Zhang, W. C. H. Choy, F. X. Xie, and X. C. Li, Org. Electron. 13, 2042 (2012). 10.1016/j.orgel.2012.06.012
-
(2012)
Org. Electron.
, vol.13
, pp. 2042
-
-
Zhang, D.1
Choy, W.C.H.2
Xie, F.X.3
Li, X.C.4
-
19
-
-
80052046389
-
-
10.1021/nn201696g
-
Y. Zhu, Z. Z. Sun, Z. Yan, Z. Jin, and J. M. Tour, ACS Nano 5, 6472 (2011). 10.1021/nn201696g
-
(2011)
ACS Nano
, vol.5
, pp. 6472
-
-
Zhu, Y.1
Sun, Z.Z.2
Yan, Z.3
Jin, Z.4
Tour, J.M.5
-
21
-
-
78650154735
-
-
10.1088/0957-4484/21/50/505204
-
H. Park, J. A. Rowehl, K. K. Kim, V. Bulovic, and J. Kong, Nanotechnology 21, 505204 (2010). 10.1088/0957-4484/21/50/505204
-
(2010)
Nanotechnology
, vol.21
, pp. 505204
-
-
Park, H.1
Rowehl, J.A.2
Kim, K.K.3
Bulovic, V.4
Kong, J.5
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