Anomalous chemical expansion behavior of Pr0.2Ce 0.8O2-δ thin films grown by pulsed laser deposition

Journal of the Electrochemical Society

Volumn 159, Issue 11, 2012, Pages

  Kuru, Y ^a,b   Marrocchelli, D ^a,c   Bishop, S R ^a,d   Chen, D ^a   Yildiz, B ^a   Tuller, H L ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b AKDENIZ UNIVERSITY   (Turkey)

^c TRINITY COLLEGE DUBLIN   (Ireland)

^d KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMISTIC SIMULATIONS; CHEMICAL EXPANSION; CHEMOMECHANICAL; COMPLEX IMPEDANCE SPECTROSCOPY; COMPLEX OXIDES; LARGE STRESS VARIATIONS; REDUCTION/OXIDATION; SITU X-RAY DIFFRACTION;

ELECTRIC PROPERTIES; PULSED LASER DEPOSITION; X RAY DIFFRACTION;

THIN FILMS;

EID: 84875593747     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.016212jes     Document Type: Article

References (50)

1. P. G. Bruce, Solid State Electrochemistry, Cambridge University Press, Cambridge (1995).
2. A. Tschöpe, W. Liu, M. Flytzani-Stephanopoulos, and J. Y. Ying, J. Catal., 157, 42 (1995).
3. A. Trovarelli, Catal. Rev. Sci. Eng., 38, 439 (1996).
4. A. Atkinson, Solid State Ionics, 95, 249 (1997).
5. H. L. Tuller, Solid State Ionics, 52, 135 (1992).
6. B. C. H. Steele and A. Heinzel, Nature, 414, 345 (2001).
7. A. J. Jacobson, Chem. Mater., 22, 660 (2010).
8. H. L. Tuller, Solid State Ionics, 131, 143 (2000).
9. A. Kossoy, Y. Feldman, E. Wachtel, I. Lubomirsky, and J. Maier, Adv. Funct. Mater., 17, 2393 (2007).
10. C. Chatzichristodoulou, P. V. Hendriksen, and A. Hagen, J. Electrochem. Soc., 157, B299 (2010).
11. C. Chatzichristodoulou and P. V. Hendriksen, J. Electrochem. Soc., 157, B481 (2010).
12. Y. Kuru, S. R. Bishop, J. J. Kim, B. Yildiz, and H. L. Tuller, Solid State Ionics, 193, 1 (2011).
13. S. R. Bishop, H. L. Tuller, Y. Kuru, and B. Yildiz, J. Eur. Ceram. Soc., 31, 2351 (2011).
14. D. Marrocchelli, S. R. Bishop, H. L. Tuller, and B. Yildiz, Adv. Funct. Mater., 22, 1958 (2012).
15. L. B. Freund and S. Suresh, Thin Film Materials: Stress, Defect Formation and Surface Evolution, Cambridge University Press, Cambridge (2003).
16. M. Ohring, Materials Science of Thin Films, Academic Press, San Diego (2002).
17. Y. Kuru, M. Wohlschlögel, U. Welzel, and E. J. Mittemeijer, Thin Solid Films, 516, 7615 (2008).
18. Y. Kuru, M. Wohlschlögel, U. Welzel, and E. J. Mittemeijer, J. Appl. Crystallogr., 41, 428 (2008).
19. J. L. M. Rupp, Solid State Ionics, 207, 1 (2012).
20. A. Kossoy, Y. Feldman, R. Korobko, E. Wachtel, I. Lubomirsky, and J. Maier, Adv. Func. Mater., 19, 634 (2009).
21. S. Hull, S. T. Norberg, I. Ahmed, S. G. Eriksson, D. Marrocchelli, and P. A. Madden, J. Solid State Chem., 182, 2815 (2009).
22. M. Burbano, S. T. Norberg, S. Hull, S. G. Eriksson, D. Marrocchelli, P. A. Madden, and G. W. Watson, Chem. Mater., 24, 222 (2012).
23. S. T. Norberg, S. Hull, I. Ahmed, S. G. Eriksson, D. Marrocchelli, P. A. Madden, P. Li, and J. T. S. Irvine, Chem. Mater., 23, 1356 (2011).
24. D. Marrocchelli, P. A. Madden, S. T. Norberg, and S. Hull, Chem. Mater., 23, 1365 (2011).
25. D. Marrocchelli, P. A. Madden, S. T. Norberg, and S. Hull, J. Phys.: Condens. Mat., 21, 405403 (2009).
26. R. E. Ferguson, E. D. Guth, and L. Eyring, J. Am. Chem. Soc., 76, 3890 (1954).
27. B. G. Hyde, D. J. M. Bevan, and L. Eyring, Philos. T. R. Soc. A, 259, 583 (1966).
28. J. D. McCullough, J. Am. Chem. Soc., 72, 1386 (1950).
29. G. Zhou and R. J. Gorte, J. Phys. Chem. B, 112, 9869 (2008).
30. C. K. Narula, L. P. Haack, W. Chun, H. W. Jen, and G. W. Graham, J. Phys. Chem. B, 103, 3634 (1999).
31. A. D. Logan and M. Shelef, J. Mater. Res., 9, 468 (1994).
32. W. Chun, G. W. Graham, J. A. Lupescu, R. W. McCabe, M. M. Koranne, and R. Brezny, Catal. Lett., 106, 95 (2006).
33. R. H. E. van Doorn and A. J. Burggraaf, Solid State Ionics, 128, 65 (2000).
34. D. Chen, S. R. Bishop, and H. L. Tuller, J. Electroceram., 28, 62 (2012).
35. U. Welzel, J. Ligot, P. Lamparter, A. C. Vermeulen, and E. J. Mittemeijer, J. Appl. Crystallogr., 38, 1 (2005).
36. V. Hauk, Structural and Residual Stress Analysis by Nondestructive Methods: Evaluation-Application-Assessment, Elsevier, Amsterdam (1997).
37. V. Kanchana, G. Vaitheeswaran, A. Svane, and A. Delin, J. Phys.: Condens. Mat., 18, 9615 (2006).
38. M. Burbano, D. Marrocchelli, B. Yildiz, H. L. Tuller, S. T. Norberg, S. Hull, P. A. Madden, and G. W. Watson, J. Phys.: Condens. Mat., 23, 255402 (2011).
39. G. J. Martyna, D. Tobias, and M. L. Klein, J. Chem. Phys., 101, 4177 (1994).
40. G. Kresse and J. Hafner, Phys. Rev. B, 49, 14251 (1994).
41. G. Kresse and J. Furthmuller, Phys. Rev. B, 54, 11169 (1996).
42. D. Marrocchelli and B. Yildiz, J. Phys. Chem. C, 116, 2411 (2012).
43. Y. Kuru, M. Wohlschlogel, U. Welzel, and E. J. Mittemeijer, Appl. Phys. Lett., 90, 243113 (2007).
44. Y.-M. Chiang, D. Birnie III, and W. D. Kingery, Physical Ceramics: Principles for Ceramic Science and Engineering, John Wiley & Sons Inc., New York (1997).
45. S. R. Bishop, T. S. Stefanik, and H. L. Tuller, Phys. Chem. Chem. Phys., 13, 10165 (2011).
46. S. R. Bishop, T. S. Stefanik, and H. L. Tuller, J. Mater. Res., 27, 2009 (2012).
47. S. R. Bishop, K. L. Duncan, and E. D. Wachsman, Acta Mater., 57, 3596 (2009).
48. A. Kossoy, J. P. Nair, E. Wachtel, I. Lubomirsky, J. Fleig, and J. Maier, J. Electroceram., 13, 605 (2004).
49. R. D. Shannon, Acta Crystallogr. Sect. A, 32, 751 (1976).
50. Y. Kuru, D. Marrocchelli, S. R. Bishop, J. J. Kim, B. Yildiz, and H. L. Tuller, to be published.