Process development and coating characteristics of plasma spray-PVD

Surface and Coatings Technology

Volumn 220, Issue , 2013, Pages 219-224

  Mauer, Georg ^a   Hospach, Andreas ^a   Vaßen, Robert ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Low pressure plasma spraying; Optical emission Spectroscopy; PS PVD; Vapor deposition

Indexed keywords

AREA COVERAGES; COATING CHARACTERISTICS; FEEDSTOCK MATERIALS; JET PROPERTIES; LOW PRESSURE PLASMA SPRAYING; PLASMA CHARACTERISTICS; PROCESS DEVELOPMENT; PS-PVD;

DEPOSITS; EMISSION SPECTROSCOPY; MICROSTRUCTURE; OPTICAL EMISSION SPECTROSCOPY; PLASMA SPRAYING; SPRAYED COATINGS; VAPOR DEPOSITION; VAPORS;

PLASMA JETS;

EID: 84875527882     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.08.067     Document Type: Article

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