Designing a deep-ultraviolet nonlinear optical material with a large second harmonic generation response

Journal of the American Chemical Society

Volumn 135, Issue 11, 2013, Pages 4215-4218

  Wu, Hongping ^a   Yu, Hongwei ^a   Yang, Zhihua ^a   Hou, Xueling ^a   Su, Xin ^a   Pan, Shilie ^a   Poeppelmeier, Kenneth R ^b   Rondinelli, James M ^c  

^a XINJIANG TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY   (China)

^b NORTHWESTERN UNIVERSITY   (United States)

^c Drexel University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANIONIC GROUP THEORY; ATOMIC DISPLACEMENT; LASER MICRO-MACHINING; MICROSCOPIC MODELS; NON-LINEAR OPTICAL MATERIAL; PHOTOCHEMICAL SYNTHESIS; POLARIZABILITIES; SEMICONDUCTOR PHOTOLITHOGRAPHY;

NONLINEAR OPTICS; PHOTOLITHOGRAPHY; SOLID STATE REACTIONS;

OPTICAL MATERIALS;

ANION; BORIC ACID; CATION; TRANSITION ELEMENT;

ARTICLE; CRYSTAL; DENSITY FUNCTIONAL THEORY; DIPOLE; MICROSCOPY; OPTICS; SECOND HARMONIC GENERATION; SOLID STATE; ULTRAVIOLET RADIATION;

EID: 84875409886     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja400500m     Document Type: Article

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