Laser doping strategies using SiN:P and SiN:B dielectric layers for profile engineering in high efficiency solar cell

Energy Procedia

Volumn 27, Issue , 2012, Pages 449-454

  Gall, S ^a   Paviet Salomon, B ^a   Lerat, J ^b   Emeraud, T ^b  

^a CEA INES   (France)

^b PV Business Unit   (Belgium)

Author keywords

Ion implantation; Passivation; Phosphorus; Screen printing; Solar cells; Thermal annealing

Indexed keywords

EID: 84875134259     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2012.07.092     Document Type: Conference Paper

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