Degradation of the antiepileptic drug carbamazepine upon different UV-based advanced oxidation processes in water

Chemical Engineering Journal

Volumn 222, Issue , 2013, Pages 150-158

  Deng, Jing ^a   Shao, Yisheng ^a,b   Gao, Naiyun ^a   Xia, Shengji ^a   Tan, Chaoqun ^a   Zhou, Shiqing ^a   Hu, Xuhao ^a  

^a TONGJI UNIVERSITY   (China)

^b China Academy of Urban Planning and Design   (China)

Author keywords

Advanced oxidation processes (AOPs); Carbamazepine (CBZ); Degradation; Hydroxyl radicals; Sulfate radicals; Ultraviolet (UV)

Indexed keywords

ADVANCED OXIDATION PROCESS; CARBAMAZEPINE; HYDROXYL RADICALS; SULFATE RADICALS; ULTRA-VIOLET;

DEGRADATION; OXIDANTS; OXIDATION RESISTANCE;

AMIDES;

EID: 84875063938     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2013.02.045     Document Type: Article

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