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Journal of Nuclear Materials

Volumn 436, Issue 1-3, 2013, Pages 118-122

Characterization and removal of co-deposition on the first mirror of HL-2A by excimer laser cleaning

(6) Hai, Ran a Xiao, Qingmei a Zhang, Lei a Ding, Hongbin a Zhou, Yan b Yan, Longwen b

a DALIAN UNIVERSITY OF TECHNOLOGY (China)

b SOUTHWESTERN INSTITUTE OF PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION PROCESS; ABLATION THRESHOLDS; CHEMICAL STATE; CODEPOSITION; DAMAGE THRESHOLD; DEPOSITED LAYER; DEPTH PROFILE; EXCIMER LASER CLEANING; FIRST MIRROR; LASER CLEANING; LASER FLUENCES; MULTIPLE PULSE; ND : YAG LASERS; SECONDARY IONS; THRESHOLD FLUENCES; TIME OF FLIGHT MASS SPECTROMETRY; WAVELENGTH RANGES;

ABLATION; DEPOSITS; EXCIMER LASERS; IMPURITIES; MASS SPECTROMETRY; MIRRORS; PHOTOELECTRONS; REMOVAL; X RAY PHOTOELECTRON SPECTROSCOPY;

CLEANING;

EID: 84874586597 PISSN: 00223115 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnucmat.2013.01.329 Document Type: Article

Times cited : (15)

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