Sensitivity enhancement of carbon nanotube based ammonium ion sensors through surface modification by using oxygen plasma treatment

Applied Physics Letters

Volumn 102, Issue 7, 2013, Pages

  Yeo, Sanghak ^a   Choi, Changrok ^b   Jang, Chi Woong ^a   Lee, Seok ^a   Jhon, Young Min ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM IONS; CARBON NANOTUBES (CNT); DEFECT SITES; INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION; OXYGEN FUNCTIONAL GROUPS; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; PLASMA DAMAGE; PLASMA TREATMENT; SENSITIVITY ENHANCEMENTS;

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; FUNCTIONAL GROUPS; INDUCTIVELY COUPLED PLASMA; PHOTOELECTRONS; PLASMA APPLICATIONS; PLASMA CVD; SENSORS; SURFACE DEFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXYGEN;

EID: 84874524292     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4793482     Document Type: Article

References (17)

1. N. Peng, Q. Z. C. L. Chow, O. K. Tan, and N. Marzari, Nano Lett. 9, 1626 (2009). 10.1021/nl803930w
2. Z. Brzózka, M. Dawgul, D. Pijanowska, and W. Torbicz, Sens. Actuators, B 44, 527 (1997). 10.1016/S0925-4005(97)00160-3
3. C. W. Jang, Y. T. Byun, and Y. M. Jhon, J. Nanosci. Nanotechnol. 12, 1765 (2012). 10.1166/jnn.2012.5843
4. L. Valentini, I. Armentano, J. M. Kenny, C. Cantalini, L. Lozzi, and S. Santucci, Appl. Phys. Lett. 82, 961 (2003). 10.1063/1.1545166
5. T. Someya, J. Small, P. Kim, C. Nuckolls, and J. T. Yardley, Nano Lett. 3, 877 (2003). 10.1021/nl034061h
6. T. Xu, J. Yang, J. Liu, and Q. Fu, Appl. Surf. Sci. 253, 8945 (2007). 10.1016/j.apsusc.2007.05.028
7. S. Kim, H. J. Kim, H. R. Lee, J. H. Song, S. N. Yi, and D. H. Ha, J. Phys. D: Appl. Phys. 43, 305402 (2010). 10.1088/0022-3727/43/30/305402
8. M. Chen, S. G. Osaki, P. O. Zamora, Appl. Surf. Sci. 255, 7257 (2009). 10.1016/j.apsusc.2009.03.079
9. S. Yeo, C. Choi, J. Yang, H. Park, J. H. Boo, and D. Jung, J. Korean Phys. Soc. 51, 1000 (2007). 10.3938/jkps.51.1000
10. S. Yeo, T. Kwon, C. Choi, H. Park, J. W. Hyun, and D. Jung, Curr. Appl. Phys. 6, 267 (2006). 10.1016/j.cap.2005.07.054
11. D. Jung, S. Yeo, J. Kim, B. Kim, B. Jin, and D. Y. Ryu, Surf. Coat. Technol. 200, 2886 (2006). 10.1016/j.surfcoat.2005.08.007
12. K. S. Kim, C. Choi, S. H. Kim, K. O. Choi, J. M. Kim, H. J. Kim, S. Yeo, H. Park, and D. Jung, Appl. Surf. Sci. 257, 398 (2010). 10.1016/j.apsusc.2010. 06.092
13. C. W. Jang, Y. T. Byun, D. H. Woo, S. Lee, and Y. M. Jhon, Appl. Phys. Lett. 101, 173104 (2012). 10.1063/1.4762829
14. N. Ishikawa, M. Curreli, C. A. Olson, H. I. Liao, R. Sun, R. W. Roberts, R. J. Cote, M. E. Thompson, and C. Zhou, ACS Nano. 4, 6914 (2010). 10.1021/nn101198u
15. A. Felten, J. Ghijsen, J. J. Pireaux, R. L. Johnson, C. M. Whelan, D. Liang, G. V. Tendeloo, and C. Bittencourt, J. Phys. D: Appl. Phys. 40, 7379 (2007). 10.1088/0022-3727/40/23/019
16. J. P. Kim, S. Hong, and S. J. Sim, J. Nanosci. Nanotechnol. 11, 4182 (2011). 10.1166/jnn.2011.3692
17. K. Maehashi, T. Katsura, K. Kerman, Y. Takamura, K. Matsumoto, and E. Tamiya Anal. Chem. 79, 782 (2007). 10.1021/ac060830g