Plasma development during picosecond laser processing of electronic materials

Journal of Heat Transfer

Volumn 122, Issue 3, 2000, Pages 424-

  Mao, Samuel S ^a   Greif, Ralph ^a   Mao, Xianglei ^a   Russo, Richard E ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

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EID: 84874235528     PISSN: 00221481     EISSN: 15288943     Source Type: Journal    
DOI: 10.1115/1.1289642     Document Type: Note

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