Summary Abstract: The effects of contaminants on aluminum film properties

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 2, Issue 2, 1984, Pages 242-243

  Reimer, J D ^a  

^a Philips Signetics Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84874035619     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.572733     Document Type: Article

References (7)

1. J. K. Howard and R. F. Ross, Appl. Phys. Lett. 11, 85 (1967).
2. M. J. Attardo, R. Rutledge, and R. C. Jack, J. Appl. Phys. 82, 4343 (1971).
3. F. D’Heurle, Proc. IEEE 59, 1409 (1971).
4. J. R. Black, Proc. 12th Rel. Phys. Symp. IEEE 142 (1974).
5. P. B. Ghate, Proc. 20th Rel. Phys. Symp. IEEE 292 (1982).
6. F. M. Reicha and P. B. Bama, Acta. Physiol. Acad. Sci. Hung. Tomus 49, 237 (1980).
7. P. Chaudhari, J. Appl. Phys. 45, 4339 (1974).