Structural properties of transparent Ti-V oxide semiconductor thin films

Central European Journal of Physics

Volumn 11, Issue 2, 2013, Pages 251-257

  Sieradzka, Karolina ^a   Kaczmarek, Danuta ^a   Morgiel, Jerzy ^b   Domaradzki, Jaroslaw ^a   Prociow, Eugeniusz ^a   Adamiak, Bogdan ^c  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b INSTITUTE OF METALLURGY AND MATERIALS SCIENCE   (Poland)

^c Karkonosze State Higher School   (Poland)

Author keywords

magnetron sputtering; oxide; structural investigation; titanium; transparent semiconductor; vanadium

Indexed keywords

EID: 84873748930     PISSN: 18951082     EISSN: 16443608     Source Type: Journal    
DOI: 10.2478/s11534-012-0150-8     Document Type: Article

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