Kinetic modeling of a photocatalytic reactor designed for removal of gas-phase benzene: A study on limiting resistances using design of experiments

Latin American Applied Research

Volumn 40, Issue 4, 2010, Pages 359-364

  Krishnan, J ^a   Swaminathan, T ^b  

^a Faculty of Chemical Engineering   (Malaysia)

^b INDIAN INSTITUTE OF TECHNOLOGY MADRAS   (India)

Author keywords

Gas phase benzene; Immobilized photoreactor; Langmuir Hinshelwood model; Photocatalysis

Indexed keywords

EID: 84873703535     PISSN: 03270793     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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