Influence of F- doping on the microstructure, surface morphology and electrochemical properties of the lead dioxide electrode

Surface and Interface Analysis

Volumn 45, Issue 3, 2013, Pages 715-721

  Kong, Haishen ^a   Li, Wei ^a   Lin, Haibo ^a,b   Shi, Zhan ^a   Lu, Haiyan ^a   Dan, Yuanyuan ^a   Huang, Weimin ^a  

^a JILIN UNIVERSITY   (China)

^b BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

aniline; anode co deposition; chemical oxygen demand; electrocatalysis; F doped; lead dioxide; pxygen evolution potential; SnO2 Sb2O5 intermediate layer; Ti substrate; XPS

Indexed keywords

CODEPOSITION; EVOLUTION POTENTIAL; INTERMEDIATE LAYERS; LEAD DIOXIDE; TI SUBSTRATES;

ANILINE; ANODIC OXIDATION; CHEMICAL OXYGEN DEMAND; ELECTROCATALYSIS; ELECTROCHEMICAL PROPERTIES; LEAD OXIDE; OXYGEN; PHOTOELECTRONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SURFACE MORPHOLOGY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROCHEMICAL ELECTRODES;

EID: 84873405740     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.5146     Document Type: Article

References (32)

1. F. Bonfatti, S. Ferro, F. Lavezzo, J. Electrochem. Soc. 1999, 146, 2175.
2. D. C. Johnson, J. Feng, L. L. Houk, Electrochim. Acta 2000, 46, 323.
3. J. P. Wang, X. Li, L. H. Guo, Appl. Surf. Sci. 2008, 254, 6666.
4. D. Velayuthan, M. Noel, Tantala 1992, 39, 481.
5. F. Bonfatti, A. De Battisti, S. Ferro, J. Appl. Electrochem. 2000, 30, 995.
6. S. Grugeon-Dewaele, L. Laruelle, L. Torcheux, J. Electrochem. Soc. 1998, 145, 3358.
7. X. H. Li, D. Pletcher, F. C. Walsha, Electrochim. Acta 2009, 54, 4688.
8. A. B. Velichenko, R. Amadelli, E. V. Gruzdev, J. Power. Sources 2009, 191, 103.
9. J. Iniesta, J. González-García, E. Expõsito, Water Res. 2001, 35, 3291.
10. C. Borras, T. Laredo, B. R. Scharifker, Electrochim. Acta 2003, 48, 2775.
11. M. H. Zhou, Q. Z. Dai, L. C. Lei, Environ. Sci. Technol. 2005, 39, 363.
12. I. Sirés, C. T. J. Low, C. Ponce-de-Leõn, Electrochim. Acta 2010, 55, 2163.
13. A. B. Velichenko, D. V. Girenko, S. V. Koval-yov, J. Electroanal. Chem. 1998, 454, 203.
14. S. Y. Ai, M. N. Gao, W. Zhang, Talanta 2004, 62, 445.
15. S. Cattarin, I. Frateur, P. Guerriero, Electrochim. Acta 2000, 45, 2279.
16. A. H. Ras, J. F. Van Staden, J. Appl. Electrochem. 1999, 29, 313.
17. W. B. Cai, H. T. Liu, W. F. Zhou, J. Appl. Electrochem. 1997, 27, 1212.
18. N. B. Tahar, A. Savall, J. Appl. Electrochem. 1999, 29, 277.
19. X. H. Li, D. Pletcher, F. C. Walsha, Chem. Soc. Rev. 2011, 40, 3879.
20. L. S. Andrade, L. A. M. Ruotolo, R. C. Rocha-Filho, Chemosphere 2007, 66, 2035.
21. R. Amadelli, L. Armelao, A. B. Velichenko, Electrochim. Acta 1999, 45, 713.
22. R. Amadelli, L. Armelao, E. Tondello, Appl. Surf. Sci. 1999, 142, 200.
23. A. B. Velichenko, D. Devilliers, J. Fluorine Chem. 2007, 128, 269.
24. A. B. Velichenko, R. Amadelli, A. Benedetti, J. Electrochem. Soc. 2002, 149, C445-C449.
25. X. B. Ren, H. Y. Lu, Y. N. Liu, Acta Chim. Sinica 2009, 67, 888.
26. Y. Cong, Z. Wu, J. Phys. Chem. C 2007, 111, 3442.
27. S. Ghasemi, H. Karami, M. F. Mousavi, Electrochem. Commun. 2005, 7, 1257.
28. S. E. Treimer, J. Feng, M. D. Scholten, J. Electrochem. Soc. 2001, 148, E459-E463.
29. R. Amadelli, L. Samiolo, A. De Battisti, J. Electrochem. Soc. 2011, 158, P87-P92.
30. R. Amadelli, A. Maldotti, A. Molinari, J. Electroana. Chem. 2002, 534, 1.
31. J. R. Sun, H. Y. Lu, H. B. Lin, App. Surf. Sci. 2011, 257, 6667.
32. X. Wang, W. M. Huang, H. T. Li, Chem. Res. Chinese U. 2010, 26, 991.