Simple removal technology of chemically stable polymer in MEMS using ozone solution

Journal of Microelectromechanical Systems

Volumn 22, Issue 1, 2013, Pages 87-93

  Yoshida, Shinya ^a   Yanagida, Hideaki ^a,b   Esashi, Masayoshi ^a   Tanaka, Shuji ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b ROHM CO LTD   (Japan)

Author keywords

Benzocyclobutene (BCB); ozone etching; polyimide; SU 8

Indexed keywords

ACID SOLUTIONS; BENZOCYCLOBUTENE; INORGANIC ADDITIVES; INORGANIC MATERIALS; ORGANIC DECOMPOSITION; ORGANIC SOLUTIONS; STABLE POLYMERS; SU-8; WET PROCESS;

ACETIC ACID; BUTENES; ETCHING; OZONE; PH; PHOTOELECTRONS; POLYIMIDES; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYMERS;

EID: 84873283032     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2012.2217374     Document Type: Article

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