Commercial silicon-on-insulator (SOI) wafers as a versatile substrate for laser desorption/ionization mass spectrometry

Journal of the American Society for Mass Spectrometry

Volumn 24, Issue 1, 2013, Pages 167-170

  Kim, Shin Hye ^a,b   Kim, Jeongkwon ^b   Moon, Dae Won ^a,c   Han, Sang Yun ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

^b Chungnam National University   (South Korea)

^c Daegu Gyeongbuk Institute of Science and Technology   (South Korea)

Author keywords

Laser desorption ionization; Laser induced surface heating; Silicon on Insulator (SOI) wafer

Indexed keywords

ACID ADDITIVES; DETECTION LIMITS; FLAT SURFACES; LASER DESORPTION/IONIZATION; LASER DESORPTION/IONIZATION MASS SPECTROMETRIES; LASER INDUCED; PEPTIDE SEQUENCING; POSTSOURCE DECAY; SI SURFACES; SILICON ON INSULATOR WAFERS; SOI WAFERS; SPECIAL SURFACES; SURFACE HEATING; THERMAL CONFINEMENT; THERMAL PROCESS;

CITRIC ACID; DESORPTION; LASERS; MASS SPECTROMETRY; PEPTIDES; TWO DIMENSIONAL;

SILICON WAFERS;

CITRIC ACID; INSULIN;

ARTICLE; ELECTRICAL EQUIPMENT; HEATING; LASER; LASER DESORPTION IONIZATION MASS SPECTROMETRY; LIMIT OF DETECTION; MASS SPECTROMETRY; PEPTIDE ANALYSIS; SILICON ON INSULATOR WAFER; TIME OF FLIGHT MASS SPECTROMETRY;

CITRIC ACID; IONS; MODELS, CHEMICAL; PEPTIDES; SILICON; SPECTROMETRY, MASS, MATRIX-ASSISTED LASER DESORPTION-IONIZATION;

EID: 84873050151     PISSN: 10440305     EISSN: 18791123     Source Type: Journal    
DOI: 10.1007/s13361-012-0534-4     Document Type: Article

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