Temperature gradient chemical vapor deposition of vertically aligned carbon nanotubes

Carbon

Volumn 54, Issue , 2013, Pages 343-352

  Youn, Seul Ki ^a   Frouzakis, Christos E ^a   Gopi, Baskar Pagadala ^b   Robertson, John ^c   Teo, Kenneth B K ^b   Park, Hyung Gyu ^a  

^a ETH ZURICH   (Switzerland)

^b AIXTRON Nanoinstruments Ltd   (United Kingdom)

^c UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROLLED GROWTH; CVD REACTORS; DOUBLE-WALLED; DWELL TIME; GAS INLET; GAS TEMPERATURE; GAS-PHASE REACTIONS; GASPHASE; SINGLE-WALLED; STRUCTURAL FEATURE; THERMAL HISTORY; THERMAL ZONES; VERTICALLY ALIGNED; VERTICALLY ALIGNED CARBON NANOTUBE;

ACETYLENE; CARBON NANOTUBES; LIGHTING; PHASE INTERFACES; THERMAL GRADIENTS; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 84872838988     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2012.11.046     Document Type: Article

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