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Thin Solid Films

Volumn 527, Issue , 2013, Pages 369-376

Effect of the deposition parameters on the structural and magnetic properties of pulsed laser ablated NiO thin films

(2) Verma, Vikram a Katiyar, Monica a

a INDIAN INSTITUTE OF TECHNOLOGY KANPUR (India)

Author keywords

Keywords; Magnetic properties; Nickel oxide; Pulsed laser deposition; Surface morphology; Thin films; X ray diffraction

Indexed keywords

ANTIFERROMAGNETIC BEHAVIORS; ANTIFERROMAGNETICS; DEPOSITED FILMS; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; EXPERIMENTAL PARAMETERS; KEYWORDS; LARGE PARTICLES; LASER ENERGIES; LASER FREQUENCY; MAGNETIC BEHAVIOR; NIO FILMS; NIO THIN FILM; OPTIMIZED PARAMETER; ORIENTATION DEPENDENT; OXYGEN PRESSURE; PINNING LAYERS; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; PULSED-LASER DEPOSITION TECHNIQUE; SI SUBSTRATES; SPIN VALVE; STRUCTURAL AND MAGNETIC PROPERTIES; STRUCTURE AND MORPHOLOGY; SUBSTRATE TEMPERATURE; SUPERPARAMAGNETIC BEHAVIOR;

ANTIFERROMAGNETISM; DEPOSITS; LASERS; MAGNETIC PROPERTIES; NICKEL OXIDE; OXYGEN; PARTICLE SIZE; PULSED LASER DEPOSITION; SUBSTRATES; SUPERPARAMAGNETISM; SURFACE MORPHOLOGY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 84872620475 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2012.12.020 Document Type: Article

Times cited : (31)

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