Thickness-driven spin reorientation transition in ultrathin films

Science China: Physics, Mechanics and Astronomy

Volumn 56, Issue 1, 2013, Pages 70-84

  Miao, Bingfeng ^a   Millev, Yonketimtchev ^b   Sun, Liang ^a   You, Biao ^a   Zhang, Wei ^a   Ding, Haifeng ^a  

^a NANJING UNIVERSITY   (China)

^b AMERICAN PHYSICAL SOCIETY   (United States)

Author keywords

magnetic anisotropy; spin reorientation transitions; ultrathin magnetic films

Indexed keywords

AC MAGNETIC SUSCEPTIBILITY; APPLIED MAGNETIC FIELDS; EXPERIMENTAL TECHNIQUES; HYSTERESIS MEASUREMENTS; MAGNETIC ANISOTROPY CONSTANT; MAGNETO-OPTICAL KERR EFFECTS; MATERIAL PARAMETER; MICROMAGNETIC STUDY; PHOTOEMISSION ELECTRON MICROSCOPY; SCANNING ELECTRON MICROSCOPY WITH POLARIZATION ANALYSIS; SPIN REORIENTATION TRANSITIONS; SPIN-POLARIZED LOW ENERGY ELECTRON MICROSCOPIES; SURFACE ANISOTROPY; THERMODYNAMIC DESCRIPTION; THICKNESS VARIATION; ULTRA THIN MAGNETIC FILMS;

ELECTRONS; MAGNETIC ANISOTROPY; PHASE DIAGRAMS; SCANNING ELECTRON MICROSCOPY; ULTRATHIN FILMS;

INTERFACES (MATERIALS);

EID: 84872595555     PISSN: 16747348     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11433-012-4975-3     Document Type: Review

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