메뉴 건너뛰기




Volumn , Issue , 2008, Pages 170-173

Uniformity requirements for electroplated cu-sn interconnects used in heterogeneous 3-D MEMS/ASIC stacks

Author keywords

Electroplating; Interconnects; MEMS; Micro bumps; SiP; Uniformity

Indexed keywords

3-D MEMS; BOND QUALITY; BONDING PROCESS; DEPOSITED METAL; HETEROGENEOUS INTEGRATION; MASK OPENING; MICRO-BUMPS; SEALING RING; SIP; SYSTEM IN A PACKAGES; UNIFORMITY;

EID: 84872507869     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (7)
  • 3
    • 0015614563 scopus 로고
    • Interdiffusion and reaction in bimetallic cu-sn thin films
    • K. N. Tu, "Interdiffusion and reaction in bimetallic Cu-Sn thin films," Acta Metallurgica, vol. 21, pp. 347-354, 1973.
    • (1973) Acta Metallurgica , vol.21 , pp. 347-354
    • Tu, K.N.1
  • 4
    • 0942266962 scopus 로고    scopus 로고
    • Thickening kinetics of interfacial cu6sn5 and cu3sn layers during reaction of liquid tin with solid copper
    • Dec
    • R. A. Gagliano and M. E. Fine, "Thickening kinetics of interfacial Cu6Sn5 and Cu3Sn layers during reaction of liquid tin with solid copper," Journal of Electronic Materials, vol. 32, pp. 1441-1447, Dec 2003.
    • (2003) Journal of Electronic Materials , vol.32 , pp. 1441-1447
    • Gagliano, R.A.1    Fine, M.E.2
  • 7
    • 51249170304 scopus 로고
    • Intermetallic phase-formation in thin SolidLiquid diffusion couples
    • Aug
    • F. Bartels, J. W. Morris, G. Dalke, and W. Gust, "Intermetallic Phase-Formation in Thin SolidLiquid Diffusion Couples," Journal of Electronic Materials, vol. 23, pp. 787-790, Aug 1994.
    • (1994) Journal of Electronic Materials , vol.23 , pp. 787-790
    • Bartels, F.1    Morris, J.W.2    Dalke, G.3    Gust, W.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.