Effect of the applied power of atmospheric pressure plasma on the adhesion of composite resin to dental ceramic

Journal of Adhesive Dentistry

Volumn 14, Issue 5, 2012, Pages 461-469

  Han, Geum Jun ^a   Chung, Sung No ^b   Chun, Bae Hyeock ^b   Kim, Chang Keun ^c   Oh, Kyu Hwan ^a   Cho, Byeong Hoon ^a  

^a Seoul National University   (South Korea)

^b NBT Ltd   (South Korea)

^c Chung Ang University   (South Korea)

Author keywords

Applied power; Ceramic bonding; Chemical composition; Hydrophilicity; Nonthermal atmospheric pressure plasma (APP); Polymer deposition

Indexed keywords

ALUMINUM SILICATE; CARBON DIOXIDE; CARBOXYL RADICAL; DENTAL MATERIAL; FREE RADICAL; HYDROFLUORIC ACID; MACROGOL DERIVATIVE; POLYMETHACRYLIC ACID DERIVATIVE; POTASSIUM DERIVATIVE; RESIN; SILANE DERIVATIVE; TRIETHYLENE GLYCOL DIMETHACRYLATE; VITA MARK II;

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL PHENOMENA; CHEMISTRY; COMPARATIVE STUDY; CONTROLLED CLINICAL TRIAL; CONTROLLED STUDY; DENTAL ACID ETCHING; DENTAL BONDING; DENTAL PORCELAIN; DENTAL PROCEDURE; ELECTROCHEMICAL ANALYSIS; FELDSPAR; HUMAN; INSTRUMENTATION; MATERIALS TESTING; MECHANICAL STRESS; METHODOLOGY; PLASMA GAS; RANDOMIZED CONTROLLED TRIAL; SCANNING ELECTRON MICROSCOPY; SHEAR STRENGTH; SURFACE PROPERTY; WETTABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

ACID ETCHING, DENTAL; ALUMINUM SILICATES; ATMOSPHERIC PRESSURE; CARBON DIOXIDE; COMPOSITE RESINS; DENTAL BONDING; DENTAL MATERIALS; DENTAL PORCELAIN; DENTAL STRESS ANALYSIS; ELECTROCHEMICAL TECHNIQUES; FREE RADICALS; HUMANS; HYDROFLUORIC ACID; HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; MATERIALS TESTING; MICROSCOPY, ELECTRON, SCANNING; PHOTOELECTRON SPECTROSCOPY; PLASMA GASES; POLYETHYLENE GLYCOLS; POLYMETHACRYLIC ACIDS; POTASSIUM COMPOUNDS; SHEAR STRENGTH; SILANES; STRESS, MECHANICAL; SURFACE PROPERTIES; WETTABILITY;

EID: 84872008970     PISSN: 14615185     EISSN: 17579988     Source Type: Journal    
DOI: 10.3290/j.jad.a25688     Document Type: Article

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