Reduced surface roughness with improved imprinting technique for polymer optical components

2012 IEEE Photonics Conference, IPC 2012

Volumn , Issue , 2012, Pages 280-281

  Lin, Xiaohui ^a   Hosseini, Amir ^b   Wang, Alan X ^c   Chen, Ray T ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b OMEGA OPTICS INC   (United States)

^c Oregon State University   (United States)

Author keywords

electron beam evaporation; electroplating; molding; polymer waveguide; surface roughness

Indexed keywords

ELECTRON BEAM EVAPORATION; HARD MOLDS; IMPRINTING TECHNIQUE; MOLDED POLYMERS; MOLDING PROCESS; OPTICAL COMPONENTS; POLYMER WAVEGUIDES;

ELECTROPLATING; EVAPORATION; MOLDING; PHASE TRANSITIONS; PHOTONICS; SURFACE ROUGHNESS;

POLYMERS;

EID: 84871816041     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IPCon.2012.6358601     Document Type: Conference Paper

References (4)

1. Y. Enami, et al., "Hybrid polymer/sol-gel waveguide modulators with exceptionally large electro-optic coefficients," Nature Photonics, vol. 1, pp. 180-185, Mar 2007.
2. D. T. Chen, et al., "Demonstration of 110 GHz electro-optic polymer modulators," Applied Physics Letters, vol. 70, pp. 3335-3337, Jun 23 1997.
3. T. Baehr-Jones, et al., "Nonlinear polymer-clad silicon slot waveguide modulator with a half wave voltage of 0.25 V," Applied Physics Letters, vol. 92, Apr 21 2008.
4. S. Y. Chou, et al., "Imprint lithography with 25-nanometer resolution," Science, vol. 272, pp. 85-87, Apr 5 1996.