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Volumn 110, Issue 1, 2013, Pages

Gas doping on the topological insulator Bi2Se3 surface

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE APPLICATION; DISSOCIATION PROCESS; EXPERIMENTAL STRATEGY; FIRST-PRINCIPLES CALCULATION; GAS DOPING; GAS MOLECULES; TOPOLOGICAL INSULATORS; VACANCY SITES;

EID: 84871815309     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.110.016403     Document Type: Article
Times cited : (37)

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