|
|
|
Volumn 23, Issue 2, 2012, Pages 143-148
|
|
Low dosage lithium augmentation in venlafaxine resistant depression: an open-label study.
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ANTIDEPRESSANT AGENT;
CYCLOHEXANOL DERIVATIVE;
LITHIUM CARBONATE;
VENLAFAXINE;
ADULT;
AGED;
ARTICLE;
BIPOLAR DISORDER;
CLINICAL TRIAL;
DEPRESSION;
DRUG COMBINATION;
DRUG RESISTANCE;
FEMALE;
HUMAN;
MAJOR DEPRESSION;
MALE;
MIDDLE AGED;
PSYCHOLOGICAL ASPECT;
YOUNG ADULT;
ADULT;
AGED;
ANTIDEPRESSIVE AGENTS;
ANTIDEPRESSIVE AGENTS, SECOND-GENERATION;
BIPOLAR DISORDER;
CYCLOHEXANOLS;
DEPRESSIVE DISORDER;
DEPRESSIVE DISORDER, MAJOR;
DRUG RESISTANCE;
DRUG THERAPY, COMBINATION;
FEMALE;
HUMANS;
LITHIUM CARBONATE;
MALE;
MIDDLE AGED;
YOUNG ADULT;
|
|
EID: 84870880664
PISSN: 11052333
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
|
Times cited : (12)
|
|
References (0)
|
