SCOPUS 정보 검색 플랫폼

Volumn 112, Issue 10, 2012, Pages

Modeling of helium plasma jets emerged into ambient air: Influence of applied voltage, jet radius, and helium flow velocity on plasma jet characteristics

(1) Naidis, G V a

a JOINT INSTITUTE FOR HIGH TEMPERATURES (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT AIR; APPLIED VOLTAGES; GOVERNING PARAMETERS; HELIUM FLOW; HELIUM JETS; HELIUM PLASMAS; PROPAGATION LENGTHS;

COMPUTER SIMULATION; FLOW VELOCITY; PLASMA JETS;

HELIUM;

EID: 84870667090 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.4766297 Document Type: Article

Times cited : (68)

References (30)

1
- 84861145433
- 10.1088/0963-0252/21/3/034005
- X. Lu, M. Laroussi, and V. Puech, Plasma Sources Sci. Technol. 21, 034005 (2012). 10.1088/0963-0252/21/3/034005
- (2012) Plasma Sources Sci. Technol. , vol.21 , pp. 034005
- Lu, X.¹ Laroussi, M.² Puech, V.³

2
- 18844424704
- 10.1109/TPS.2005.845377
- M. Teschke, J. Kedzierski, E. G. Finantu-Dinu, D. Korzec, and J. Engemann, IEEE Trans. Plasma Sci. 33, 310 (2005). 10.1109/TPS.2005.845377
- (2005) IEEE Trans. Plasma Sci. , vol.33 , pp. 310
- Teschke, M.¹ Kedzierski, J.² Finantu-Dinu, E.G.³ Korzec, D.⁴ Engemann, J.⁵

3
- 33749343864
- 10.1063/1.2349475
- X. Lu and M. Laroussi, J. Appl. Phys. 100, 063302 (2006). 10.1063/1.2349475
- (2006) J. Appl. Phys. , vol.100 , pp. 063302
- Lu, X.¹ Laroussi, M.²

4
- 63749121583
- 10.1088/0022-3727/42/5/055207
- N. Mericam-Bourdet, M. Laroussi, A. Begum, and E. Karakas, J. Phys. D: Appl. Phys. 42, 055207 (2009). 10.1088/0022-3727/42/5/055207
- (2009) J. Phys. D: Appl. Phys. , vol.42 , pp. 055207
- Mericam-Bourdet, N.¹ Laroussi, M.² Begum, A.³ Karakas, E.⁴

5
- 75749096848
- 10.1063/1.3298639
- Y. Sakiyama, D. B. Graves, J. Jarrige, and M. Laroussi, Appl. Phys. Lett. 96, 041501 (2010). 10.1063/1.3298639
- (2010) Appl. Phys. Lett. , vol.96 , pp. 041501
- Sakiyama, Y.¹ Graves, D.B.² Jarrige, J.³ Laroussi, M.⁴

6
- 77149152779
- 10.1088/0022-3727/43/9/095201
- K. Urabe, T. Morita, K. Tachibana, and B. N. Ganguly, J. Phys. D: Appl. Phys. 43, 095201 (2010). 10.1088/0022-3727/43/9/095201
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 095201
- Urabe, K.¹ Morita, T.² Tachibana, K.³ Ganguly, B.N.⁴

7
- 65449151828
- 10.1063/1.3119212
- Q. Xiong, X. Lu, K. Ostrikov, Z. Xiong, Y. Xian, F. Zhou, C. Zou, J. Hu, W. Gong, and Z. Jiang, Phys. Plasmas 16, 043505 (2009). 10.1063/1.3119212
- (2009) Phys. Plasmas , vol.16 , pp. 043505
- Xiong, Q.¹ Lu, X.² Ostrikov, K.³ Xiong, Z.⁴ Xian, Y.⁵ Zhou, F.⁶ Zou, C.⁷ Hu, J.⁸ Gong, W.⁹ Jiang, Z.¹⁰

8
- 70350648238
- 10.1088/0022-3727/42/20/202002
- W.-C. Zhu, Q. Li, X.-M. Zhu, and Y.-K. Pu, J. Phys. D: Appl. Phys. 42, 202002 (2009). 10.1088/0022-3727/42/20/202002
- (2009) J. Phys. D: Appl. Phys. , vol.42 , pp. 202002
- Zhu, W.-C.¹ Li, Q.² Zhu, X.-M.³ Pu, Y.-K.⁴

9
- 77749339847
- 10.1063/1.3295914
- Q. Li, X.-M. Zhu, J.-T. Li, and Y.-K. Pu, J. Appl. Phys. 107, 043304 (2010). 10.1063/1.3295914
- (2010) J. Appl. Phys. , vol.107 , pp. 043304
- Li, Q.¹ Zhu, X.-M.² Li, J.-T.³ Pu, Y.-K.⁴

10
- 77950557556
- 10.1063/1.3330507
- H. S. Park, S. J. Kim, H. M. Joh, T. H. Chung, S. H. Bae, and S. H. Leem, Phys. Plasmas 17, 033502 (2010). 10.1063/1.3330507
- (2010) Phys. Plasmas , vol.17 , pp. 033502
- Park, H.S.¹ Kim, S.J.² Joh, H.M.³ Chung, T.H.⁴ Bae, S.H.⁵ Leem, S.H.⁶

11
- 78649929823
- 10.1088/0963-0252/19/6/065005
- J. Jarrige, M. Laroussi, and E. Karakas, Plasma Sources Sci. Technol. 19, 065005 (2010). 10.1088/0963-0252/19/6/065005
- (2010) Plasma Sources Sci. Technol. , vol.19 , pp. 065005
- Jarrige, J.¹ Laroussi, M.² Karakas, E.³

12
- 77951578751
- 10.1063/1.3369538
- Q. Xiong, X. Lu, Y. Xian, J. Liu, C. Zou, Z. Xiong, W. Gong, K. Chen, X. Pei, F. Zou, J. Hu, Z. Jiang, and Y. Pan, J. Appl. Phys. 107, 073302 (2010). 10.1063/1.3369538
- (2010) J. Appl. Phys. , vol.107 , pp. 073302
- Xiong, Q.¹ Lu, X.² Xian, Y.³ Liu, J.⁴ Zou, C.⁵ Xiong, Z.⁶ Gong, W.⁷ Chen, K.⁸ Pei, X.⁹ Zou, F.¹⁰ Hu, J.¹¹ Jiang, Z.¹² Pan, Y.¹³

13
- 77957729961
- 10.1063/1.3483935
- E. Karakas and M. Laroussi, J. Appl. Phys. 108, 063305 (2010). 10.1063/1.3483935
- (2010) J. Appl. Phys. , vol.108 , pp. 063305
- Karakas, E.¹ Laroussi, M.²

14
- 77950585568
- 10.1088/0022-3727/43/15/155202
- E. Karakas, M. Koklu, and M. Laroussi, J. Phys. D: Appl. Phys. 43, 155202 (2010). 10.1088/0022-3727/43/15/155202
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 155202
- Karakas, E.¹ Koklu, M.² Laroussi, M.³

15
- 84861162093
- 10.1088/0963-0252/21/3/034007
- J. L. Walsh, P. Olszewski, and J. W. Bradley, Plasma Sources Sci. Technol. 21, 034007 (2012). 10.1088/0963-0252/21/3/034007
- (2012) Plasma Sources Sci. Technol. , vol.21 , pp. 034007
- Walsh, J.L.¹ Olszewski, P.² Bradley, J.W.³

16
- 84865249817
- 10.1063/1.4746700
- R. Xiong, Q. Xiong, A. Yu. Nikiforov, P. Vanraes, and C. Leys, J. Appl. Phys. 112, 033305 (2012). 10.1063/1.4746700
- (2012) J. Appl. Phys. , vol.112 , pp. 033305
- Xiong, R.¹ Xiong, Q.² Yu. Nikiforov, A.³ Vanraes, P.⁴ Leys, C.⁵

17
- 70450196226
- 10.1088/0022-3727/42/23/232002
- C. Jiang, M. T. Chen, and M. A. Gundersen, J. Phys. D: Appl. Phys. 42, 232002 (2009). 10.1088/0022-3727/42/23/232002
- (2009) J. Phys. D: Appl. Phys. , vol.42 , pp. 232002
- Jiang, C.¹ Chen, M.T.² Gundersen, M.A.³

18
- 78650296815
- 10.1063/1.3511448
- Z. Xiong, X. Lu, Y. Xian, Z. Jiang, and Y. Pan, J. Appl. Phys. 108, 103303 (2010). 10.1063/1.3511448
- (2010) J. Appl. Phys. , vol.108 , pp. 103303
- Xiong, Z.¹ Lu, X.² Xian, Y.³ Jiang, Z.⁴ Pan, Y.⁵

19
- 76749100220
- 10.1088/0022-3727/43/7/075201
- J. L. Walsh, F. Iza, N. B. Janson, V. J. Law, and M. G. Kong, J. Phys. D: Appl. Phys. 43, 075201 (2010). 10.1088/0022-3727/43/7/075201
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 075201
- Walsh, J.L.¹ Iza, F.² Janson, N.B.³ Law, V.J.⁴ Kong, M.G.⁵

20
- 77951015880
- 10.1088/0022-3727/43/16/165201
- R. Bussian, E. Kindel, H. Lange, and K.-D. Weltmann, J. Phys. D: Appl. Phys. 43, 165201 (2010). 10.1088/0022-3727/43/16/165201
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 165201
- Bussian, R.¹ Kindel, E.² Lange, H.³ Weltmann, K.-D.⁴

21
- 78249276810
- 10.1088/0022-3727/43/40/402001
- G. V. Naidis, J. Phys. D: Appl. Phys. 43, 402001 (2010). 10.1088/0022-3727/43/40/402001
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 402001
- Naidis, G.V.¹

22
- 79956156868
- 10.1088/0022-3727/44/21/215203
- G. V. Naidis, J. Phys. D: Appl. Phys. 44, 215203 (2011). 10.1088/0022-3727/44/21/215203
- (2011) J. Phys. D: Appl. Phys. , vol.44 , pp. 215203
- Naidis, G.V.¹

23
- 79954531460
- 10.1063/1.3576940
- G. V. Naidis, Appl. Phys. Lett. 98, 141501 (2011). 10.1063/1.3576940
- (2011) Appl. Phys. Lett. , vol.98 , pp. 141501
- Naidis, G.V.¹

24
- 80155154314
- 10.1063/1.3655199
- J. Jansky and A. Bourdon, Appl. Phys. Lett. 99, 161504 (2011). 10.1063/1.3655199
- (2011) Appl. Phys. Lett. , vol.99 , pp. 161504
- Jansky, J.¹ Bourdon, A.²

25
- 80053196881
- 10.1063/1.3636433
- D. Breden, K. Miki, and L. L. Raja, Appl. Phys. Lett. 99, 111501 (2011). 10.1063/1.3636433
- (2011) Appl. Phys. Lett. , vol.99 , pp. 111501
- Breden, D.¹ Miki, K.² Raja, L.L.³

26
- 84861164224
- 10.1088/0963-0252/21/3/034011
- D. Breden, K. Miki, and L. L. Raja, Plasma Sources Sci. Technol. 21, 034011 (2012). 10.1088/0963-0252/21/3/034011
- (2012) Plasma Sources Sci. Technol. , vol.21 , pp. 034011
- Breden, D.¹ Miki, K.² Raja, L.L.³

27
- 27744564154
- 10.1088/0963-0252/14/4/011
- G. J. M. Hagelaar and L. C. Pitchford, Plasma Sources Sci. Technol. 14, 722 (2005). 10.1088/0963-0252/14/4/011
- (2005) Plasma Sources Sci. Technol. , vol.14 , pp. 722
- Hagelaar, G.J.M.¹ Pitchford, L.C.²

28
- 50249138362
- 10.1109/TPS.2008.924495
- J. L. Walsh and M. G. Kong, IEEE Trans. Plasma Sci. 36, 954 (2008). 10.1109/TPS.2008.924495
- (2008) IEEE Trans. Plasma Sci. , vol.36 , pp. 954
- Walsh, J.L.¹ Kong, M.G.²

29
- 79955700639
- 10.1063/1.3574256
- D. B. Kim, H. Jung, B. Gweon, S. Y. Moon, J. K. Rhee, and W. Choe, Phys. Plasmas 18, 043503 (2011). 10.1063/1.3574256
- (2011) Phys. Plasmas , vol.18 , pp. 043503
- Kim, D.B.¹ Jung, H.² Gweon, B.³ Moon, S.Y.⁴ Rhee, J.K.⁵ Choe, W.⁶

30
- 84861147151
- 10.1088/0963-0252/21/3/034009
- B. L. Sands, S. K. Huang, J. W. Speltz, M. A. Niekamp, J. B. Schmidt, and B. N. Ganguly, Plasma Sources Sci. Technol. 21, 034009 (2012). 10.1088/0963-0252/21/3/034009
- (2012) Plasma Sources Sci. Technol. , vol.21 , pp. 034009
- Sands, B.L.¹ Huang, S.K.² Speltz, J.W.³ Niekamp, M.A.⁴ Schmidt, J.B.⁵ Ganguly, B.N.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.