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Volumn 33, Issue 12, 2012, Pages 1732-1734

Silicon solar cell with integrated tunnel junction for multijunction photovoltaic applications

Author keywords

Multijunction (MJ) solar cell; photovoltaic; silicon (Si); tunnel junction (TJ)

Indexed keywords

BOTTOM CELLS; ELECTRICAL PERFORMANCE; ILLUMINATION LEVELS; MULTIJUNCTION; NORMAL OPERATIONS; PHOTOVOLTAIC; PHOTOVOLTAIC APPLICATIONS; PHOTOVOLTAIC CHARACTERISTICS; RAPID THERMAL DIFFUSION; SI SOLAR CELLS; SI-BASED; SOLAR CELL STRUCTURES; SOLAR-CELL APPLICATIONS;

EID: 84870418526     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2012.2217391     Document Type: Article
Times cited : (15)

References (11)
  • 1
    • 84861050518 scopus 로고    scopus 로고
    • Siliconbased multi-junction solar cell with 19.7% efficiency at 1-sun using areal current matching for 2-terminal operation
    • J. F. Yang, D. Cheong, J. Rideout, S. Tavakoli, and R. Kleiman, "Siliconbased multi-junction solar cell with 19.7% efficiency at 1-sun using areal current matching for 2-terminal operation," in Proc. 37th IEEE Photovoltaic Spec. Conf., 2011, pp. 001019-001024.
    • (2011) Proc. 37th IEEE Photovoltaic Spec. Conf , pp. 001019-001024
    • Yang, J.F.1    Cheong, D.2    Rideout, J.3    Tavakoli, S.4    Kleiman, R.5
  • 2
    • 0031701003 scopus 로고    scopus 로고
    • Heteroepitaxial technologies on Si for high-efficiency solar cells
    • PII S0927024896001499
    • M. Umeno, T. Soga, K. Baskar, and T. Jimbo, "Heteroepitaxial technologies on Si for high-efficiency solar cells," Solar Energy Mater. Solar Cells, vol. 50, no. 1-4, pp. 203-212, Jan. 1998. (Pubitemid 128387610)
    • (1998) Solar Energy Materials and Solar Cells , vol.50 , Issue.1-4 , pp. 203-212
    • Umeno, M.1    Soga, T.2    Baskar, K.3    Jimbo, T.4
  • 10
    • 0028731975 scopus 로고
    • Fabrication of submicron junctions-proximity rapid thermal diffusion of phosphorus, boron, and arsenic
    • Dec
    • W. Zagozdzon-Wosik, P. B. Grabiec, and G. Lux, "Fabrication of submicron junctions-proximity rapid thermal diffusion of phosphorus, boron, and arsenic," IEEE Trans. Electron Devices, vol. 41, no. 12, pp. 2281-2290, Dec. 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , Issue.12 , pp. 2281-2290
    • Zagozdzon-Wosik, W.1    Grabiec, P.B.2    Lux, G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.