Relationship between peroxide radical species on plasma-treated PFA surface and adhesion strength of PFA/electroless copper-plating film

Current Applied Physics

Volumn 12, Issue SUPPL.3, 2012, Pages

  Hara, Yasuhiro ^a   Ooka, Kento ^a   Zettsu, Nobuyuki ^b   Yamamura, Kazuya ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Adhesion strength; Atmospheric pressure plasma; Electroless copper plating; Peroxide; PFA

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; CU LAYERS; ELECTROLESS; ELECTROLESS COPPER PLATING; FLUOROPOLYMER; GRAFT COPOLYMERIZATION; HIGH-ADHESION; PD CATALYST; PFA; PLASMA TREATMENT; POLY(4-VINYLPYRIDINE) (P4VP); RADICAL SPECIES; SELECTIVE FORMATION; SIDE-CHAINS; SURFACE METALLIZATION; VINYL ETHERS;

BOND STRENGTH (MATERIALS); CATALYST SUPPORTS; COPPER; COPPER PLATING; ENVIRONMENTAL IMPACT; ETHERS; FLUORINE CONTAINING POLYMERS; GRAFTING (CHEMICAL); INTERFACES (MATERIALS); OXIDATION; PALLADIUM; PEROXIDES; PLASMA APPLICATIONS; PLASMAS; POLYMER FILMS; SURFACE ROUGHNESS;

ADHESION;

EID: 84869497909     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2012.05.007     Document Type: Article

References (21)

1. A. Negishi Fluorine Chemistry 1988 Maruzen Tokyo 108
2. N. Inagaki, S. Tasaka, and Y.W. Park J. Adhes. Sci. Technol. 12 1998 1105
3. N. Inagaki, S. Tasaka, and T. Umehara J. Appl. Polym. Sci. 71 1999 2191
4. L.M. Siperko, and R.R. Thomas J. Adhes. Sci. Technol. 3 1989 157
5. K. Lunkwitz, W. Buger, U. Lappan, H.J. Brink, and A. Ferse J. Adhes. Sci. Technol. 9 1995 297
6. E.T. Kang, K.L. Tan, K. Kato, Y. Uyama, and Y. Ikada Macromolecules 29 1996 6872
7. T. Wang, E.T. Kang, K.G. Neoh, K.L. Tan, C.Q. Cui, and T.B. Lim J. Adhes. Sci. Technol. 11 1997 679
8. I. Noh, K. Chittur, S.L. Goodman, and J.A. Hubbell J. Polym. Sci. A: Polym. Chem. 35 1997 1499
9. S. Wu, E.T. Kang, K.G. Neoh, H.S. Han, and K.L. Tan Macromolecules 32 1999 186
10. E.T. Kang, Y.X. Liu, K.G. Neoh, K.L. Tan, C.Q. Cui, and T.B. Lim J. Adhes. Sci. Technol. 13 1999 293
11. N. Inagaki, S. Tasaka, K. Narushima, and K. Mochizuki Macromolecules 32 1999 8566
12. N. Inagaki, K. Narushima, and T. Yamamoto J. Appl. Polym. Sci. 85 2002 1087
13. M. Okubo, M. Tahara, T. Kuroki, T. Hibimo, and N. Saeki J. Polym. Sci. Technol. 21 2008 219
14. L. O'Neill, L.-A. O'sHare, S.R. Leadley, and A.J. Goodwin Chem. Vap. Depos. 11 2005 477
15. L.-A. O'sHare, L. O'Neill, and A.J. Goodwin Surf. Interface Anal. 38 2006 1519
16. W.C. Wang, Y. Zhang, E.T. Kang, and K.G. Neoh Plasma. Polym. 7 2002 207
17. N. Zettsu, H. Ito, and K. Yamamura Thin Solid Films 516 2008 6683
18. N. Zettsu, H. Ito, and K. Yamamura Surf. Coat. Technol. 202 2008 5284
19. H. Akiyama, N. Zettsu, and K. Yamamura Thin Solid Films 518 2010 3551
20. H. Akiyama, K. Yamamura, and N. Zettsu Trans. Mater. Res. Soc. Jpn. 35 2010 817
21. Y. Momose, Y. Tamura, M. Ogino, S. Okazaki, and M. Hirayama J. Vac. Sci. Technol. A 10 1992 229