UV-stabilisation of polystyrene-based nanocomposites provided by polyhedral oligomeric silsesquioxanes (POSS)

Polymer Degradation and Stability

Volumn 97, Issue 11, 2012, Pages 2313-2322

  Dintcheva, N Tz ^a   Morici, E ^a   Arrigo, R ^a   La Mantia, F P ^a   Malatesta, V ^b   Schwab, J J ^c  

^a UNIVERSITY OF PALERMO   (Italy)

^b UNIVERSITY OF MILANO BICOCCA   (Italy)

^c Hybrid Plastics   (United States)

Author keywords

Molecular silica; Photo oxidation; Polystyrene; POSS nanofiller; UV stabilizers

Indexed keywords

FILM PREPARATION; NANOCOMPOSITES; OLIGOMERS; POLYSTYRENES; STABILIZATION; WEATHERING;

ACCELERATED WEATHERING; HYDROXYL GROUPS; NANOFILLER; POLYHEDRAL OLIGOMERIC SILSEQUIOXANE; POLYHEDRAL OLIGOMERIC SILSESQUIOXANES; POLYMERIC MATRICES; PROTECTION EFFICIENCY; UV STABILIZER;

NANOCOMPOSITE FILMS;

EID: 84869234632     PISSN: 01413910     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymdegradstab.2012.07.034     Document Type: Article

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