Deposition of amorphous chromium layers

Journal of Solid State Electrochemistry

Volumn 16, Issue 11, 2012, Pages 3551-3558

  Schröder, Norbert ^b   Sonntag, Birgit ^c   Plieth, Waldfried ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b Ancosys GmbH   (Germany)

^c ATOTECH DEUTSCHLAND GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM FILM; CHROMIUM LAYER; DC CONDITIONS; OPTIMIZED CONDITIONS; PULSE CURRENT DENSITIES; PULSE LENGTH; PULSE PLATING; PULSE SEQUENCE; TRIVALENT CHROMIUM;

CHROMIUM; ELECTROLYTES; FORMIC ACID;

AMORPHOUS CARBON;

EID: 84868616972     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-012-1826-0     Document Type: Article

References (9)

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