Enhancement of field emission and hydrophobic properties of silicon nanowires by chemical vapor deposited carbon nanoflakes coating

Applied Surface Science

Volumn 261, Issue , 2012, Pages 223-230

  Banerjee, D ^a   Das, N S ^a   Chattopadhyay, K K ^a  

^a JADAVPUR UNIVERSITY   (India)

Author keywords

Carbon nanoflakes; Field emission; Hydrophobicity; Raman study; Silicon nanowires

Indexed keywords

CARBON; ELECTRIC FIELDS; ELECTRONS; FIELD EMISSION; HYDROPHOBICITY; NANOWIRES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPECTROMETERS; SURFACE ROUGHNESS; VAPOR DEPOSITION;

CARBON NANOFLAKES; CHEMICAL VAPOR DEPOSITED; CHEMICAL-ETCHING PROCESS; ELECTRON FIELD EMISSION; EMISSION CHARACTERISTICS; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; RAMAN STUDIES; SILICON NANOWIRES;

ELECTRON EMISSION;

EID: 84867746658     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.07.148     Document Type: Article

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