Leakage current mechanisms in high performance alumina-silicone nanolaminate dielectrics

Applied Physics Letters

Volumn 101, Issue 14, 2012, Pages

  Sahoo, S K ^a   Patel, R P ^b   Wolden, C A ^b  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b Department of Metallurgical and Materials Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTION MECHANISM; CONDUCTION PROCESS; CURRENT MECHANISMS; HIGH-FIELD REGIONS; METAL INSULATOR METAL CAPACITOR (MIM); NANO-LAMINATES; NANOLAMINATE; SHALLOW TRAPS; SPACE CHARGE LIMITED CURRENTS; TEMPERATURE DEPENDENT;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICONES;

ALUMINA;

EID: 84867500472     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4756788     Document Type: Article

References (28)

1. R. P. Ortiz, A. Facchetti, and T. J. Marks, Chem. Rev. 110, 205 (2010). 10.1021/cr9001275
2. M. C. Choi, Y. Kim, and C. S. Ha, Prog. Polym. Sci. 33, 581 (2008). 10.1016/j.progpolymsci.2007.11.004
3. G. Dennler, C. Lungenschmied, H. Neugebauer, N. S. Sariciftci, M. Latrèche, G. Czeremuszkin, and M. R. Wertheimer, Thin Solid Films 511-512, 349 (2006). 10.1016/j.tsf.2005.12.091
4. A. L. Deman, M. Erouel, D. Lallemand, M. Phaner-Goutorbe, P. Lang, and J. Tardy, J. Non-Cryst. Solids 354, 1598 (2008). 10.1016/j.jnoncrysol.2007.10.027
5. D. K. Hwang, W. Choi, J.-M. Choi, K. Lee, J. H. Park, E. Kim, J. H. Kim, and S. Im, J. Electrochem. Soc. 154, H933 (2007). 10.1149/1.2775169
6. D. K. Hwang, C. S. Kim, J. M. Choi, K. Lee, J. H. Park, E. Kim, H. K. Baik, J. H. Kim, and S. Im, Adv. Mater. 18, 2299 (2006). 10.1002/adma.200600409
7. K. Kukli, J. Ihanus, M. Ritala, and M. Leskelä, J. Electrochem. Soc. 144, 300 (1997). 10.1149/1.1837399
8. H. Kattelus, M. Ylilammi, J. Saarilahti, J. Antson, and S. Lindfors, Thin Solid Films 225, 296 (1993). 10.1016/0040-6090(93)90173-M
9. P. C. Rowlette and C. A. Wolden, Thin Solid Films 518, 3337 (2010). 10.1016/j.tsf.2009.10.136
10. J.-M. Choi, K. Lee, D. K. Hwang, J. H. Park, E. Kim, and S. Im, Electrochem. Solid-State Lett. 9, G289 (2006). 10.1149/1.2211847
11. Y. G. Seol, J. S. Park, N. T. Tien, N. E. Lee, D. K. Lee, S. C. Lee, Y. J. Kim, C. S. Lee, and H. Kim, J. Electrochem. Soc. 157, H1046 (2010). 10.1149/1.3489944
12. K. Choi, D. K. Hwang, K. Lee, J. H. Kim, and S. Im, Electrochem. Solid State Lett. 10, H114 (2007). 10.1149/1.2428410
13. G. L. Graff, R. E. Williford, and P. E. Burrows, J. Appl. Phys. 96, 1840 (2004). 10.1063/1.1768610
14. S. K. Sahoo, D. Misra, D. C. Agrawal, Y. N. Mohapatra, S. B. Majumder, and R. S. Katiyar, J. Appl. Phys. 109, 064108 (2011). 10.1063/1.3563576
15. S. K. Sahoo, D. C. Agrawal, Y. N. Mohapatra, S. B. Majumder, and R. S. Katiyar, Appl. Phys. Lett. 85, 5001 (2004). 10.1063/1.1825074
16. S. K. Sahoo, D. Misra, D. C. Agrawal, Y. N. Mohapatra, S. B. Majumder, and R. S. Katiyar, J. Appl. Phys. 108, 074112 (2010). 10.1063/1.3490187
17. S. K. Sahoo and D. Misra, J. Appl. Phys. 110, 084104 (2011). 10.1063/1.3651087
18. S.-J. Ding, J. Xu, Y. Huang, Q.-Q. Sun, D. W. Zhang, and M.-F. Li, Appl. Phys. Lett. 93, 092909 (2008). 10.1063/1.2969399
19. R. P. Patel, D. Chiavetta, and C. A. Wolden, J. Vac. Sci. Technol. A 29, 061508 (2011). 10.1116/1.3652918
20. R. P. Patel and C. A. Wolden, J. Vac. Sci. Technol. A 29, 021012 (2011). 10.1116/1.3553149
21. M. T. Seman, D. N. Richards, P. Rowlette, and C. A. Wolden, Chem. Vapor Depos. 14, 296 (2008). 10.1002/cvde.200806701
22. S. F. Szymanski, P. Rowlette, and C. A. Wolden, J. Vac. Sci. Technol. A 26, 1079 (2008). 10.1116/1.2891258
23. H. Yang, B. Chen, K. Tao, X. Qiu, B. Xu, and B. Zhao, Appl. Phys. Lett. 83, 1611 (2003). 10.1063/1.1604181
24. M. A. Lampert and P. Mark, Current Injection in Solids (Academic, New York, 1970).
25. K. Y. Cheong, J. H. Moon, H. J. Kim, W. Bahng, and N.-K. Kim, Appl. Phys. Lett. 90, 162113 (2007). 10.1063/1.2730731
26. H. C. Lin, P. D. Ye, and G. D. Wilk, Solid State Electron. 50, 1012 (2006). 10.1016/j.sse.2006.04.021
27. I. Y.-K. Chang and J. Y.-M. Lee, Appl. Phys. Lett. 93, 223503 (2008). 10.1063/1.3039074
28. P. Zhang, F. Chen, Y. Liu, and Q. Lei, Annual Report Conference on Electrical Insulation and Dielectric Phenomena, Vancouver, British Columbia, Canada, 14-17 October 2007, p. 260.